JPS56156770A - Structural material for high temperature - Google Patents

Structural material for high temperature

Info

Publication number
JPS56156770A
JPS56156770A JP6052080A JP6052080A JPS56156770A JP S56156770 A JPS56156770 A JP S56156770A JP 6052080 A JP6052080 A JP 6052080A JP 6052080 A JP6052080 A JP 6052080A JP S56156770 A JPS56156770 A JP S56156770A
Authority
JP
Japan
Prior art keywords
structural material
high temperature
thin layer
coating
produced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6052080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS643947B2 (enrdf_load_stackoverflow
Inventor
Tsutae Takahashi
Hideo Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP6052080A priority Critical patent/JPS56156770A/ja
Publication of JPS56156770A publication Critical patent/JPS56156770A/ja
Publication of JPS643947B2 publication Critical patent/JPS643947B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
JP6052080A 1980-05-09 1980-05-09 Structural material for high temperature Granted JPS56156770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6052080A JPS56156770A (en) 1980-05-09 1980-05-09 Structural material for high temperature

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6052080A JPS56156770A (en) 1980-05-09 1980-05-09 Structural material for high temperature

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP59246266A Division JPS60187679A (ja) 1984-11-22 1984-11-22 高温炉用構造材
JP24626784A Division JPS60187677A (ja) 1984-11-22 1984-11-22 高温炉用構造材

Publications (2)

Publication Number Publication Date
JPS56156770A true JPS56156770A (en) 1981-12-03
JPS643947B2 JPS643947B2 (enrdf_load_stackoverflow) 1989-01-24

Family

ID=13144669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6052080A Granted JPS56156770A (en) 1980-05-09 1980-05-09 Structural material for high temperature

Country Status (1)

Country Link
JP (1) JPS56156770A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4724169A (en) * 1984-10-09 1988-02-09 Ovonic Synthetic Materials Company, Inc. Method of producing multilayer coatings on a substrate
CN106637037A (zh) * 2016-09-14 2017-05-10 西安交通大学 超低气氛下的高能高速等离子射流沉积SiC涂层及其制备方法和应用

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4724169A (en) * 1984-10-09 1988-02-09 Ovonic Synthetic Materials Company, Inc. Method of producing multilayer coatings on a substrate
CN106637037A (zh) * 2016-09-14 2017-05-10 西安交通大学 超低气氛下的高能高速等离子射流沉积SiC涂层及其制备方法和应用

Also Published As

Publication number Publication date
JPS643947B2 (enrdf_load_stackoverflow) 1989-01-24

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