JPS56156770A - Structural material for high temperature - Google Patents
Structural material for high temperatureInfo
- Publication number
- JPS56156770A JPS56156770A JP6052080A JP6052080A JPS56156770A JP S56156770 A JPS56156770 A JP S56156770A JP 6052080 A JP6052080 A JP 6052080A JP 6052080 A JP6052080 A JP 6052080A JP S56156770 A JPS56156770 A JP S56156770A
- Authority
- JP
- Japan
- Prior art keywords
- structural material
- high temperature
- thin layer
- coating
- produced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
PURPOSE:To obtain structural material for high temperature having high heat resistance and which is not oxidized when heated to a high temperature in the air or in a vacuum, by coating a thin layer consisting of >=1 kinds of C, SiC, TiC and B4C on the surface of structural material consisting of Mo or Mo alloy. CONSTITUTION:This objective structural material for high temperature is produced by coating the surface of structural material consisting of Mo or Mo alloy with a thin layer consisting of C, SiC, TiC and B4C having a normal 5-50mu thickness. Although the coating of thin layer consisting of C or carbide and be performed by the plasma melt-spraying method, electroplating method, etc., the thin layer produced by the vapour phase plating method has a more compact structure and a higher adhesive strength than those produced by other methods. Moreover, this structural material for high temperature has an extremely high heat resistance and is not oxidizied or evaporated even when it is heated to about 1,500 deg.C temperature in the air and in a vacuum.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6052080A JPS56156770A (en) | 1980-05-09 | 1980-05-09 | Structural material for high temperature |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6052080A JPS56156770A (en) | 1980-05-09 | 1980-05-09 | Structural material for high temperature |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59246266A Division JPS60187679A (en) | 1984-11-22 | 1984-11-22 | Structural material for high temperature furnace |
JP24626784A Division JPS60187677A (en) | 1984-11-22 | 1984-11-22 | Structural material for high temperature furnace |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56156770A true JPS56156770A (en) | 1981-12-03 |
JPS643947B2 JPS643947B2 (en) | 1989-01-24 |
Family
ID=13144669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6052080A Granted JPS56156770A (en) | 1980-05-09 | 1980-05-09 | Structural material for high temperature |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56156770A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4724169A (en) * | 1984-10-09 | 1988-02-09 | Ovonic Synthetic Materials Company, Inc. | Method of producing multilayer coatings on a substrate |
CN106637037A (en) * | 2016-09-14 | 2017-05-10 | 西安交通大学 | High-energy and high-speed plasma jet deposition SiC coating under ultralow atmosphere as well as preparation method and application thereof |
-
1980
- 1980-05-09 JP JP6052080A patent/JPS56156770A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4724169A (en) * | 1984-10-09 | 1988-02-09 | Ovonic Synthetic Materials Company, Inc. | Method of producing multilayer coatings on a substrate |
CN106637037A (en) * | 2016-09-14 | 2017-05-10 | 西安交通大学 | High-energy and high-speed plasma jet deposition SiC coating under ultralow atmosphere as well as preparation method and application thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS643947B2 (en) | 1989-01-24 |
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