JPS56152971A - Sputtering device - Google Patents

Abstract

PURPOSE: To obain a titled device which does not backflow atmospheric components and others into a treating chamber and can protect the inside of the treating chamber against contamination by so constituting the same that a sputtering gas is flowed from the inside of the treating chamber into a charging chamber and a takeout chamber while all the sluice valves are open.

CONSTITUTION: A charging chamber 1 and an intermediate heating chamber 5 housing substrates are evacuated by means of a vacuum pump 11. A takeout chamber 3 and an intermediate cooling chamber 8 are also evacuated in a similar manner. The inside of the chamber 3 once opens to the atmosphere, but next it is closed and the inside of the respective chambers 3, 8 is evacuated a vacuum pump 13. Further, a sputtering gas 13 is introduced ito a sputtering chamber 2, which is then evacuated by the pump 13 to create a gaseous atmosphere of a high vacuum. Next, sluice valves 4, 6, 9 are opened and the substrates in the chamber 1 are successively transferred into the chamber 5 and chamber 2 and the chamber 8 and chamber 3. The introduction of said gas into the chamber 2 is continued; at the same time, the evacuation from the chamber 1 and chamber 3 is continued, so that the flows going from the inside of the chamber 2 to the chamber 1 and the chamber 2 are produced. Hence, atmospheric components and others are prevented from being backflowed into the chamber 2 and the inside of said chamber is protected from contamination.

COPYRIGHT: (C)1981,JPO&Japio