JPS561526A - Substrate holding jig for substrate treatment - Google Patents
Substrate holding jig for substrate treatmentInfo
- Publication number
- JPS561526A JPS561526A JP7612879A JP7612879A JPS561526A JP S561526 A JPS561526 A JP S561526A JP 7612879 A JP7612879 A JP 7612879A JP 7612879 A JP7612879 A JP 7612879A JP S561526 A JPS561526 A JP S561526A
- Authority
- JP
- Japan
- Prior art keywords
- substrate holding
- holding plate
- metal
- substrate
- carbide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title abstract 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 3
- 229910044991 metal oxide Inorganic materials 0.000 abstract 3
- 150000004706 metal oxides Chemical class 0.000 abstract 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 239000011259 mixed solution Substances 0.000 abstract 1
- 229910017604 nitric acid Inorganic materials 0.000 abstract 1
- 238000007788 roughening Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7612879A JPS561526A (en) | 1979-06-15 | 1979-06-15 | Substrate holding jig for substrate treatment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7612879A JPS561526A (en) | 1979-06-15 | 1979-06-15 | Substrate holding jig for substrate treatment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS561526A true JPS561526A (en) | 1981-01-09 |
JPS6339093B2 JPS6339093B2 (enrdf_load_stackoverflow) | 1988-08-03 |
Family
ID=13596287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7612879A Granted JPS561526A (en) | 1979-06-15 | 1979-06-15 | Substrate holding jig for substrate treatment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS561526A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5230923A (en) * | 1975-09-04 | 1977-03-09 | Osaka Gas Co Ltd | Burner with total use-hour indicator |
JPS622240U (enrdf_load_stackoverflow) * | 1985-06-20 | 1987-01-08 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0491584U (enrdf_load_stackoverflow) * | 1990-12-26 | 1992-08-10 | ||
JPH0491583U (enrdf_load_stackoverflow) * | 1990-12-26 | 1992-08-10 | ||
KR102581508B1 (ko) * | 2021-08-27 | 2023-09-22 | 주식회사 디오 | 디지털 오버덴쳐의 제조방법 |
KR102590346B1 (ko) * | 2021-08-27 | 2023-10-18 | 주식회사 디오 | 디지털 오버덴쳐의 제조방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5378765A (en) * | 1976-12-23 | 1978-07-12 | Toshiba Corp | Semiconductor wafer heating stand for gas phase growth |
JPS5464460U (enrdf_load_stackoverflow) * | 1977-10-14 | 1979-05-08 | ||
JPS5475661U (enrdf_load_stackoverflow) * | 1977-11-09 | 1979-05-29 |
-
1979
- 1979-06-15 JP JP7612879A patent/JPS561526A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5378765A (en) * | 1976-12-23 | 1978-07-12 | Toshiba Corp | Semiconductor wafer heating stand for gas phase growth |
JPS5464460U (enrdf_load_stackoverflow) * | 1977-10-14 | 1979-05-08 | ||
JPS5475661U (enrdf_load_stackoverflow) * | 1977-11-09 | 1979-05-29 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5230923A (en) * | 1975-09-04 | 1977-03-09 | Osaka Gas Co Ltd | Burner with total use-hour indicator |
JPS622240U (enrdf_load_stackoverflow) * | 1985-06-20 | 1987-01-08 |
Also Published As
Publication number | Publication date |
---|---|
JPS6339093B2 (enrdf_load_stackoverflow) | 1988-08-03 |
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