JPS56148841A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS56148841A
JPS56148841A JP5205580A JP5205580A JPS56148841A JP S56148841 A JPS56148841 A JP S56148841A JP 5205580 A JP5205580 A JP 5205580A JP 5205580 A JP5205580 A JP 5205580A JP S56148841 A JPS56148841 A JP S56148841A
Authority
JP
Japan
Prior art keywords
film
si3n4
patterned
built
polycrystal silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5205580A
Other languages
Japanese (ja)
Inventor
Masabumi Kubota
Takeya Ezaki
Osamu Ishikawa
Kosei Kajiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5205580A priority Critical patent/JPS56148841A/en
Publication of JPS56148841A publication Critical patent/JPS56148841A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)

Abstract

PURPOSE:To decrease defective patterning and improve yield by a method wherein a mask necessary for introducing impurities is patterned before selective oxidation, and subsequent processes are self-aligned. CONSTITUTION:An N<-> type layer 21 is formed on an N<+> type substrate 20, a thermal oxide film 22 for decreasing strain is made up and an active base layer 36 is built up. An Si3N4 23 and a thin polycrystal silicon film 24 are formed as the first oxidation preventing films, and patterned by using an oversized mask. An Si3N4 film 25 as the second oxidatipn preventing film is made up, and patterned leaving base-emitter window sections. A field oxide film 26 is built up. Accurate patterning can be conducted by forming windows by utilizing difference between the etching characteristics of the polycrystal silicon 24 and the Si3N4 film 25.
JP5205580A 1980-04-18 1980-04-18 Manufacture of semiconductor device Pending JPS56148841A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5205580A JPS56148841A (en) 1980-04-18 1980-04-18 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5205580A JPS56148841A (en) 1980-04-18 1980-04-18 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS56148841A true JPS56148841A (en) 1981-11-18

Family

ID=12904115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5205580A Pending JPS56148841A (en) 1980-04-18 1980-04-18 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS56148841A (en)

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