JPS56148830A - Developing device for semiconductor substrate - Google Patents

Developing device for semiconductor substrate

Info

Publication number
JPS56148830A
JPS56148830A JP5309280A JP5309280A JPS56148830A JP S56148830 A JPS56148830 A JP S56148830A JP 5309280 A JP5309280 A JP 5309280A JP 5309280 A JP5309280 A JP 5309280A JP S56148830 A JPS56148830 A JP S56148830A
Authority
JP
Japan
Prior art keywords
washing
developing
semiconductor substrate
nozzle
developing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5309280A
Other languages
Japanese (ja)
Inventor
Hidemi Amai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5309280A priority Critical patent/JPS56148830A/en
Publication of JPS56148830A publication Critical patent/JPS56148830A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To remove the generation of trouble due to the adhesion of a developing liquid by mounting a washing means washing a main surface at the side adsorbed to a vacuum chuck of a substrate to a semiconductor substrate developing device provided with the vacuum chuck having a rotary function. CONSTITUTION:A wafer back washing nozzle 6 is installed to a semiconductor substrate developing device which makes a semicondutor substrate 3 adsorb to a vacuum chuck 2 having a rotary function by means of a motor 1, sprays a developing liquid from a developing nozzle 4 (5 is a washing nozzle) and develops, a washing liquid or pure water is ejected and the back is washed. Thus, the generation of trouble due to the adhesion of the developing liquid can be prevented because the developing liquid, which is ejected from the nozzle 4 and adheres on the back, can be washed and removed.
JP5309280A 1980-04-22 1980-04-22 Developing device for semiconductor substrate Pending JPS56148830A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5309280A JPS56148830A (en) 1980-04-22 1980-04-22 Developing device for semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5309280A JPS56148830A (en) 1980-04-22 1980-04-22 Developing device for semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS56148830A true JPS56148830A (en) 1981-11-18

Family

ID=12933132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5309280A Pending JPS56148830A (en) 1980-04-22 1980-04-22 Developing device for semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS56148830A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58124241A (en) * 1982-01-21 1983-07-23 Nec Corp Developing device for semiconductor substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58124241A (en) * 1982-01-21 1983-07-23 Nec Corp Developing device for semiconductor substrate

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