JPS57197069A - Apparatus for coating resist film - Google Patents

Apparatus for coating resist film

Info

Publication number
JPS57197069A
JPS57197069A JP8127881A JP8127881A JPS57197069A JP S57197069 A JPS57197069 A JP S57197069A JP 8127881 A JP8127881 A JP 8127881A JP 8127881 A JP8127881 A JP 8127881A JP S57197069 A JPS57197069 A JP S57197069A
Authority
JP
Japan
Prior art keywords
resist
solvent
groove
jig
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8127881A
Other languages
Japanese (ja)
Inventor
Kozo Hosogai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Priority to JP8127881A priority Critical patent/JPS57197069A/en
Publication of JPS57197069A publication Critical patent/JPS57197069A/en
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To enable to automatically remove and clean photoresist adhered to a spinner outer wall by providing a resist receiving jig comprising means for washing and recovering scattered resist in a resist coating apparatus for coating IC substrate or the like with resist.
CONSTITUTION: A resist receiving jig 4 is provided between a spinner outer wall 1 and a turn table 2. The jig 4 has an org. solvent emtting tube 5 attached to the upper part thereof and, to the lower part thereof, a groove as a nozzle 6 is slitted toward a circumferential direction. A solvent is supplied from a pour-in port 9 and uniformly flowed out toward a circumferential direction from the nozzle of the emitting tube 5 to be directed to a resist accumulating groove 10 formed by two conical surfaces 11, 11'. In this time, the resist adhered to the resist receiving plate is dissolved. A drain pore 7 is opened at one place of the accumulating groove 10 and this position is made lowest of the groove surface to collect the solvent in the accumulating groove 10. The drain pore 7 is directly connected to a recovery bottle 8 and the solvent is fallen and recovered into the recovery bottle 8 to be reused.
COPYRIGHT: (C)1982,JPO&Japio
JP8127881A 1981-05-29 1981-05-29 Apparatus for coating resist film Pending JPS57197069A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8127881A JPS57197069A (en) 1981-05-29 1981-05-29 Apparatus for coating resist film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8127881A JPS57197069A (en) 1981-05-29 1981-05-29 Apparatus for coating resist film

Publications (1)

Publication Number Publication Date
JPS57197069A true JPS57197069A (en) 1982-12-03

Family

ID=13741897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8127881A Pending JPS57197069A (en) 1981-05-29 1981-05-29 Apparatus for coating resist film

Country Status (1)

Country Link
JP (1) JPS57197069A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61283126A (en) * 1985-05-20 1986-12-13 マシン　テクノロジ−　インコ−ポレイテツド Method and apparatus for washing inner wall of processing station
JPS6481223A (en) * 1987-09-22 1989-03-27 Nec Corp Coater for multi-layer film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61283126A (en) * 1985-05-20 1986-12-13 マシン　テクノロジ−　インコ−ポレイテツド Method and apparatus for washing inner wall of processing station
JPS6481223A (en) * 1987-09-22 1989-03-27 Nec Corp Coater for multi-layer film
JPH054808B2 (en) * 1987-09-22 1993-01-20 Nippon Electric Co

Similar Documents

Publication Publication Date Title
FR2523876B1 (en) APPARATUS AND METHOD FOR APPLYING A COATING ON A SUBSTRATE WITH VACUUM HARDENING AND SOLVENT RECOVERY
JPS57197069A (en) Apparatus for coating resist film
JPS5727168A (en) Equipment for wet treatment
JPS5766657A (en) Apparatus for automatically removing molded film before finish plating for external lead of molded semiconductor device
JPS5670871A (en) Painting booth
JPS5230789A (en) Method for washing catalyst and its equipment
JPS536204A (en) Scum removing apparatus
JPS5297265A (en) Bubbling cleaning method for liquid pipe system
JPS57132525A (en) Washing method of filter of dust collector
JPS55145588A (en) Suspended matter removing apparatus
JPS5638199A (en) Concentrating filtration technique of aggregated sludge and its apparatus
JPS5536944A (en) Method and device for washing rectangular substrate
JPS57174370A (en) Removal of adhesive by spray cleaning
JPS57154836A (en) Washing method for semiconductor wafer, mask, etc.
SE8502990L (en) DEVICE WATER DISPOSAL DEVICE FOR CLEANING ROOM CLEANING
JPS54161945A (en) Method and apparatus for liquid guide
JPS542905A (en) Scum removing device
JPS54103266A (en) Ultrasonic cleaner
JPS5714196A (en) Cleaning ball
JPS5314461A (en) Apparatus for sucking floating oil
JPS54159872A (en) Small piece washing method
JPS5435477A (en) Air filtration apparatus
JPS5670872A (en) Painting booth
JPS5213168A (en) Filtering apparatus for continous cleaning of filtering cloth
JPS5364805A (en) Pump equipment for exposing