JPS56142892A - Plate passing through type plating method of strip resulting in reduce electrodeposition strain - Google Patents

Plate passing through type plating method of strip resulting in reduce electrodeposition strain

Info

Publication number
JPS56142892A
JPS56142892A JP4404680A JP4404680A JPS56142892A JP S56142892 A JPS56142892 A JP S56142892A JP 4404680 A JP4404680 A JP 4404680A JP 4404680 A JP4404680 A JP 4404680A JP S56142892 A JPS56142892 A JP S56142892A
Authority
JP
Japan
Prior art keywords
strip
plating bath
plating
strain
posture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4404680A
Other languages
Japanese (ja)
Inventor
Hajime Kimura
Katsuhiko Iwanuma
Hideo Sunami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP4404680A priority Critical patent/JPS56142892A/en
Publication of JPS56142892A publication Critical patent/JPS56142892A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE: To prevent the generation of fine cracks in a plating film, in subjecting a strip to the plating treatment while said strip is passed through a plating bath, by holding an immersion posture of the strip in the plating bath so as to apply a tensile strain along a surface of said strip to counterbalance the electrodeposition strain.
CONSTITUTION: A strip is continuously run through a plating bath and a current is applied between an anode contacted with the plating bath and the strip to subject said strip to the plating bath and the strip to subject said strip to the plating treatment. In this case, the strip is entered into the plating bath while held in a curved posture in such a manner that bending strain corresponding to the electrodeposition strain which must be generated in a plating film as the plating treatment advances is added to the strip and, after taken out from the plating bath, restored to a straight posture to reduce the electrodeposition strain. In this case, the curved posture of the strip during immersing said strip in the plating bath is controlled so as to limit a curve radius in a range of 700W2,000mm and the curved posture is carried out at least over a half circumference.
COPYRIGHT: (C)1981,JPO&Japio
JP4404680A 1980-04-05 1980-04-05 Plate passing through type plating method of strip resulting in reduce electrodeposition strain Pending JPS56142892A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4404680A JPS56142892A (en) 1980-04-05 1980-04-05 Plate passing through type plating method of strip resulting in reduce electrodeposition strain

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4404680A JPS56142892A (en) 1980-04-05 1980-04-05 Plate passing through type plating method of strip resulting in reduce electrodeposition strain

Publications (1)

Publication Number Publication Date
JPS56142892A true JPS56142892A (en) 1981-11-07

Family

ID=12680666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4404680A Pending JPS56142892A (en) 1980-04-05 1980-04-05 Plate passing through type plating method of strip resulting in reduce electrodeposition strain

Country Status (1)

Country Link
JP (1) JPS56142892A (en)

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