JPS56137634A - Pattern forming - Google Patents

Pattern forming

Info

Publication number
JPS56137634A
JPS56137634A JP4169180A JP4169180A JPS56137634A JP S56137634 A JPS56137634 A JP S56137634A JP 4169180 A JP4169180 A JP 4169180A JP 4169180 A JP4169180 A JP 4169180A JP S56137634 A JPS56137634 A JP S56137634A
Authority
JP
Japan
Prior art keywords
film
photoresist
exposed
diffraction grating
grating pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4169180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6220689B2 (enrdf_load_stackoverflow
Inventor
Susumu Nanba
Shinji Matsui
Hiroaki Aritome
Kazuyuki Moriwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP4169180A priority Critical patent/JPS56137634A/ja
Publication of JPS56137634A publication Critical patent/JPS56137634A/ja
Publication of JPS6220689B2 publication Critical patent/JPS6220689B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Bipolar Transistors (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP4169180A 1980-03-29 1980-03-29 Pattern forming Granted JPS56137634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4169180A JPS56137634A (en) 1980-03-29 1980-03-29 Pattern forming

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4169180A JPS56137634A (en) 1980-03-29 1980-03-29 Pattern forming

Publications (2)

Publication Number Publication Date
JPS56137634A true JPS56137634A (en) 1981-10-27
JPS6220689B2 JPS6220689B2 (enrdf_load_stackoverflow) 1987-05-08

Family

ID=12615442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4169180A Granted JPS56137634A (en) 1980-03-29 1980-03-29 Pattern forming

Country Status (1)

Country Link
JP (1) JPS56137634A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6343101A (ja) * 1986-08-08 1988-02-24 Toyo Commun Equip Co Ltd 透過型回折格子の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5259580A (en) * 1975-11-11 1977-05-17 Matsushita Electric Ind Co Ltd Photo etching method
JPS5389673A (en) * 1977-01-19 1978-08-07 Oki Electric Ind Co Ltd Fine pattern forming method of semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5259580A (en) * 1975-11-11 1977-05-17 Matsushita Electric Ind Co Ltd Photo etching method
JPS5389673A (en) * 1977-01-19 1978-08-07 Oki Electric Ind Co Ltd Fine pattern forming method of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6343101A (ja) * 1986-08-08 1988-02-24 Toyo Commun Equip Co Ltd 透過型回折格子の製造方法

Also Published As

Publication number Publication date
JPS6220689B2 (enrdf_load_stackoverflow) 1987-05-08

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