JPS5613721A - Ion injector - Google Patents

Ion injector

Info

Publication number
JPS5613721A
JPS5613721A JP8827379A JP8827379A JPS5613721A JP S5613721 A JPS5613721 A JP S5613721A JP 8827379 A JP8827379 A JP 8827379A JP 8827379 A JP8827379 A JP 8827379A JP S5613721 A JPS5613721 A JP S5613721A
Authority
JP
Japan
Prior art keywords
disc
shafts
wafers
radial direction
vessels
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8827379A
Other languages
Japanese (ja)
Inventor
Toshimichi Taya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8827379A priority Critical patent/JPS5613721A/en
Publication of JPS5613721A publication Critical patent/JPS5613721A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation

Landscapes

  • Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

PURPOSE:To simplify a scanning mechanism by a mechanism wherein wafers are arranged on a circumference of a rotatory disc and reciprocated at uniform velocity in the radial direction. CONSTITUTION:Each of wafer holders 5 mounted on the surface of a ratatory disc 4 can vertically be moved along guide holes 13 in the radial direction. Tension is applied to the outside at all times by centrifugal force and springs 6 because the disc is turned at high speed. Thus, the wafers are vertically moved by shifting shafts 9 through bearings 8 and strings 7. Portions among both the shafts 9 and vacuum vessels 14 and both the axes of rotation 10 and the shafts 9 are sealed 11, 12 under vacuum conditions by an electromagnetic fluid. This constitution eliminates the need for the vertical movement of the whole disc and the angles of the injection of beams, and miniaturizes the vessels.
JP8827379A 1979-07-13 1979-07-13 Ion injector Pending JPS5613721A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8827379A JPS5613721A (en) 1979-07-13 1979-07-13 Ion injector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8827379A JPS5613721A (en) 1979-07-13 1979-07-13 Ion injector

Publications (1)

Publication Number Publication Date
JPS5613721A true JPS5613721A (en) 1981-02-10

Family

ID=13938286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8827379A Pending JPS5613721A (en) 1979-07-13 1979-07-13 Ion injector

Country Status (1)

Country Link
JP (1) JPS5613721A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006060159A (en) * 2004-08-24 2006-03-02 Sumitomo Eaton Noba Kk Method and apparatus for beam irradiation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006060159A (en) * 2004-08-24 2006-03-02 Sumitomo Eaton Noba Kk Method and apparatus for beam irradiation

Similar Documents

Publication Publication Date Title
JPS55104057A (en) Ion implantation device
JPS5617341A (en) Alignment stage for step and repeat exposure
CA1063990A (en) Air levitation device for an air driven centrifuge
JPS5613721A (en) Ion injector
US4604262A (en) Apparatus for positioning and locating a baffle plate in a crucible
JPS5748401A (en) Super-high precision lathe
JPS5746456A (en) Ion injector
EP0136394A3 (en) Method and apparatus for solution of gas in liquid
JPS6490521A (en) Cvd system
JPS5470017A (en) Chuck for mounting thin plate information recording carriers
JPS5580855A (en) Rotary arm type positioning mechanism
JPS645764A (en) Rotation device for optical fiber connector
SU755328A1 (en) Apparatus for sorting parts by diameter
JPS5717131A (en) Retaining device for semiconductor wafer
JPS5521835A (en) Method and device of coating internal surface of cathode ray tube
JPS5458690A (en) Vapor deposition apparatus
SU426802A1 (en) DEVICE FOR BASING AND ROTATING OF PRODUCTS
JPS5721821A (en) Coating method for wafer
JPS5669826A (en) Ion injector
JPS57150815A (en) Irradiation beam deflecting device
JPS61114456A (en) Ion implantation equipment
JPS51116392A (en) A sample driving method in super high vacuum
JPS55137871A (en) Manufacturing of valve housing for fuel injection valve housing
JPS567441A (en) Wire bonding device
JPS57122695A (en) Driving system for stepping motor