JPS6490521A - Cvd system - Google Patents
Cvd systemInfo
- Publication number
- JPS6490521A JPS6490521A JP24857387A JP24857387A JPS6490521A JP S6490521 A JPS6490521 A JP S6490521A JP 24857387 A JP24857387 A JP 24857387A JP 24857387 A JP24857387 A JP 24857387A JP S6490521 A JPS6490521 A JP S6490521A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- holding body
- gas
- driving mechanism
- rotation driving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To form a uniform film, by employing a specific structure in which a wafer holding body is disposed in a cylinder section for wafer holding body, and a rotation driving mechanism which rotates the wafer holding body is provided. CONSTITUTION:A wafer 13 placed on a wafer holding body 12 is rotated at a constant rotating speed by a rotation driving mechanism as the wafer 13 is heated by an RF coil 20. Reaction gas is flowed from a gas inflow port 7 into a reaction tube main body 3 which is inclined to the horizontal plane, and guided smoothly on the wafer 13 placed on the holding body 12 by a reaction gas guiding member 14, thereby a predetermined film is formed on the upper surface of the wafer 13. The reacted gas is further flowed to the lower stream with respect to the holding body 12, and then ejected outward from a gas orifice 11 provided throughout a base 8. As a result, since the wafer 13 is rotated during the film formation, an uniform film is formed over the full upper surface of the wafer 13.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24857387A JPS6490521A (en) | 1987-09-30 | 1987-09-30 | Cvd system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24857387A JPS6490521A (en) | 1987-09-30 | 1987-09-30 | Cvd system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6490521A true JPS6490521A (en) | 1989-04-07 |
Family
ID=17180148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24857387A Pending JPS6490521A (en) | 1987-09-30 | 1987-09-30 | Cvd system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6490521A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02291114A (en) * | 1989-04-29 | 1990-11-30 | Toyoda Gosei Co Ltd | Vapor growth apparatus for compound semiconductor |
| JP2006216597A (en) * | 2005-02-01 | 2006-08-17 | Hitachi Kokusai Electric Inc | Substrate processing apparatus |
| WO2008001582A1 (en) | 2006-06-28 | 2008-01-03 | Sharp Kabushiki Kaisha | Complex birefringent medium, polarizing plate, and liquid crystal device |
-
1987
- 1987-09-30 JP JP24857387A patent/JPS6490521A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02291114A (en) * | 1989-04-29 | 1990-11-30 | Toyoda Gosei Co Ltd | Vapor growth apparatus for compound semiconductor |
| JP2006216597A (en) * | 2005-02-01 | 2006-08-17 | Hitachi Kokusai Electric Inc | Substrate processing apparatus |
| WO2008001582A1 (en) | 2006-06-28 | 2008-01-03 | Sharp Kabushiki Kaisha | Complex birefringent medium, polarizing plate, and liquid crystal device |
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