JPS5458690A - Vapor deposition apparatus - Google Patents

Vapor deposition apparatus

Info

Publication number
JPS5458690A
JPS5458690A JP12453477A JP12453477A JPS5458690A JP S5458690 A JPS5458690 A JP S5458690A JP 12453477 A JP12453477 A JP 12453477A JP 12453477 A JP12453477 A JP 12453477A JP S5458690 A JPS5458690 A JP S5458690A
Authority
JP
Japan
Prior art keywords
pulley
jig
main shaft
shaft
fixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12453477A
Other languages
Japanese (ja)
Inventor
Kenichi Ikeda
Yasushi Asami
Toshio Hashimoto
Takao Nagasaki
Yukio Murakawa
Keiichi Nagasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi High Tech Corp
Original Assignee
Hitachi Ltd
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Ltd
Priority to JP12453477A priority Critical patent/JPS5458690A/en
Publication of JPS5458690A publication Critical patent/JPS5458690A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide a vapor deposition apparatus which is capable of forming uniform deposited membrane, by smooth transmission of revolution between a wafer chucking jig and chuck setting jig by use of a gear mechanism. CONSTITUTION:A main shaft 3 is made to pass through a supporting rod 2 installed at the upper part of a treating space in a bell jar, and at the lower end of the main shaft 3 is attached a supporting plate 7 which extends horizontally in three directions. At the three extended ends of the plate 7 are fitted rotatable shafts 8. A spring belt is applied to a pulley 10 fixed at the upper end of the shaft 8 and to outer periphery of a supporting pipe 6, so that the pulley 10 is rotated by the rotation of the main shaft 3. The lower part of the shaft 8 pierces the center of a master pulley 13, and at the projected end of the pulley 13 is fixed a chuck setting jig 15. At the peripheral part of the jig 15 are attached six rotatable shafts 16, to which are fixed disc wafer-chucking jigs 20 at the lower ends. The transmission of revolution between the jigs 15 and 20 is conducted with a master gear 26 and an auxiliary gear 27 which are coupled directly. In Figure, 24, 22 show material to be evaporated and wafers respectively.
JP12453477A 1977-10-19 1977-10-19 Vapor deposition apparatus Pending JPS5458690A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12453477A JPS5458690A (en) 1977-10-19 1977-10-19 Vapor deposition apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12453477A JPS5458690A (en) 1977-10-19 1977-10-19 Vapor deposition apparatus

Publications (1)

Publication Number Publication Date
JPS5458690A true JPS5458690A (en) 1979-05-11

Family

ID=14887845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12453477A Pending JPS5458690A (en) 1977-10-19 1977-10-19 Vapor deposition apparatus

Country Status (1)

Country Link
JP (1) JPS5458690A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5596162U (en) * 1978-12-25 1980-07-03
JPS6042729U (en) * 1983-08-31 1985-03-26 株式会社島津製作所 Film forming equipment
CN103290382A (en) * 2013-05-15 2013-09-11 宁波韵升股份有限公司 Planetary workpiece frame of vacuum coating machine

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4897775A (en) * 1972-03-28 1973-12-12

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4897775A (en) * 1972-03-28 1973-12-12

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5596162U (en) * 1978-12-25 1980-07-03
JPS6042729U (en) * 1983-08-31 1985-03-26 株式会社島津製作所 Film forming equipment
CN103290382A (en) * 2013-05-15 2013-09-11 宁波韵升股份有限公司 Planetary workpiece frame of vacuum coating machine

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