JPS6042729U - Film forming equipment - Google Patents

Film forming equipment

Info

Publication number
JPS6042729U
JPS6042729U JP13480883U JP13480883U JPS6042729U JP S6042729 U JPS6042729 U JP S6042729U JP 13480883 U JP13480883 U JP 13480883U JP 13480883 U JP13480883 U JP 13480883U JP S6042729 U JPS6042729 U JP S6042729U
Authority
JP
Japan
Prior art keywords
wafer
film forming
forming equipment
rotating bowl
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13480883U
Other languages
Japanese (ja)
Inventor
淡野　直一郎
繁信 岡田
Original Assignee
株式会社島津製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社島津製作所 filed Critical 株式会社島津製作所
Priority to JP13480883U priority Critical patent/JPS6042729U/en
Publication of JPS6042729U publication Critical patent/JPS6042729U/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来例を示す概略断面図である。第２図〜第４
図は本考案の一実施例を示し、第２図は概略断面図、第
３図は要部を示す一部切欠した拡大図、第４図はホルダ
駆動機構の構成を示す概略説明図である。 ２・・・材料放出源（蒸発源）、１２・・・回転椀、１
３・・・ウェハホルダ、１６・・・ホルダ駆動機構。FIG. 1 is a schematic sectional view showing a conventional example. Figures 2 to 4
The figures show one embodiment of the present invention, FIG. 2 is a schematic sectional view, FIG. 3 is a partially cutaway enlarged view showing the main part, and FIG. 4 is a schematic explanatory view showing the configuration of the holder drive mechanism. . 2... Material release source (evaporation source), 12... Rotating bowl, 1
3... Wafer holder, 16... Holder drive mechanism.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 材料放出源に対面しつつ自、公転運動を行なう回転椀の
非軸心部分に複数のウェハホルダを設け、このウェハホ
ルダに支持させたウェハの表面に前記材料放出源側から
供給される材料を膜状に被着させ得るように構成した成
膜装置において、前記ウェハホルダを前記回転椀に対し
て自転可能に設けるとともに、前記回転椀の運動時に該
ウェハホルダを自転させるホルダ駆動機構を設けたこと
を特徴とする成膜装置。A plurality of wafer holders are provided on the off-axis portion of the rotating bowl that revolves around itself while facing the material ejection source, and the material supplied from the material ejection source side is applied in the form of a film onto the surface of the wafer supported by the wafer holders. In the film forming apparatus configured to be able to deposit the wafer on the wafer, the wafer holder is provided so as to be able to rotate relative to the rotating bowl, and a holder drive mechanism is provided that rotates the wafer holder when the rotating bowl moves. Film forming equipment.
JP13480883U 1983-08-31 1983-08-31 Film forming equipment Pending JPS6042729U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13480883U JPS6042729U (en) 1983-08-31 1983-08-31 Film forming equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13480883U JPS6042729U (en) 1983-08-31 1983-08-31 Film forming equipment

Publications (1)

Publication Number Publication Date
JPS6042729U true JPS6042729U (en) 1985-03-26

Family

ID=30303645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13480883U Pending JPS6042729U (en) 1983-08-31 1983-08-31 Film forming equipment

Country Status (1)

Country Link
JP (1) JPS6042729U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03191059A (en) * 1989-12-20 1991-08-21 Matsushita Electric Ind Co Ltd Sputtering device
JP2007100123A (en) * 2005-09-30 2007-04-19 Kyocera Kinseki Corp Vacuum vapor deposition apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5458690A (en) * 1977-10-19 1979-05-11 Hitachi Ltd Vapor deposition apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5458690A (en) * 1977-10-19 1979-05-11 Hitachi Ltd Vapor deposition apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03191059A (en) * 1989-12-20 1991-08-21 Matsushita Electric Ind Co Ltd Sputtering device
JP2007100123A (en) * 2005-09-30 2007-04-19 Kyocera Kinseki Corp Vacuum vapor deposition apparatus

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