JPS60151580U - Substrate holder for spin coating equipment - Google Patents
Substrate holder for spin coating equipmentInfo
- Publication number
- JPS60151580U JPS60151580U JP4148984U JP4148984U JPS60151580U JP S60151580 U JPS60151580 U JP S60151580U JP 4148984 U JP4148984 U JP 4148984U JP 4148984 U JP4148984 U JP 4148984U JP S60151580 U JPS60151580 U JP S60151580U
- Authority
- JP
- Japan
- Prior art keywords
- substrate holder
- substrate
- spin coating
- coating equipment
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の基板ホルダーにより塗布したフォトレジ
スト膜厚分布を示す図、第２図は本考案の一実施例によ
る基板ホルダーの斜視図、第３図は本考案の基板ホルダ
ーを使用して塗布したフォトレジスト膜厚分布を示す断
面図、第４図は基板ホルダー凹部に深さ調節機構を設け
た本考案の変形実施例によるホルダーの断面図である。
図において、１は基板、２はフォトレジスト膜、２１は
フォトレジスト膜凸部、３及び４はホルダー、３１及び
４１はホルダー凹部、３２及び４２、はホルダー周辺部
、４３は基板受は台、４４は調節ネジである。Fig. 1 is a diagram showing the photoresist film thickness distribution applied by a conventional substrate holder, Fig. 2 is a perspective view of a substrate holder according to an embodiment of the present invention, and Fig. 3 is a diagram showing a photoresist film thickness distribution applied using the substrate holder of the present invention. FIG. 4 is a cross-sectional view showing the thickness distribution of the applied photoresist film, and FIG. 4 is a cross-sectional view of a holder according to a modified embodiment of the present invention in which a depth adjustment mechanism is provided in the substrate holder recess. In the figure, 1 is a substrate, 2 is a photoresist film, 21 is a photoresist film protrusion, 3 and 4 are holders, 31 and 41 are holder recesses, 32 and 42 are holder peripheral parts, 43 is a substrate holder, 44 is an adjustment screw.
Claims (2)
ける基板ホルダーであって、その上面に基板の外形と同
一形状で、かつ該基板の厚さと同一の深さの凹部を設け
たことを特徴とする回転塗布装置の基板ホルダー。(1) A substrate holder for use in an apparatus for spin-coating a photoresist film onto a substrate, characterized in that a recessed portion having the same shape as the outer shape of the substrate and the same depth as the thickness of the substrate is provided on the upper surface of the substrate holder. Substrate holder for rotary coating equipment.
深さを変え、基板上面と基板ホルダー上面とを同一平面
となす調節機構を設けたことを特徴とする実用新案登録
請求の範囲第（１）項に記載の回転塗布装置の基板ホル
ダー。(2) The scope of the utility model registration claim, characterized in that an adjustment mechanism is provided in the recess to change the depth of the recess according to the thickness of the substrate and to make the upper surface of the substrate and the upper surface of the substrate holder on the same plane. A substrate holder for the spin coating apparatus according to item (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4148984U JPS60151580U (en) | 1984-03-22 | 1984-03-22 | Substrate holder for spin coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4148984U JPS60151580U (en) | 1984-03-22 | 1984-03-22 | Substrate holder for spin coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60151580U true JPS60151580U (en) | 1985-10-08 |
Family
ID=30551361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4148984U Pending JPS60151580U (en) | 1984-03-22 | 1984-03-22 | Substrate holder for spin coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60151580U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002336764A (en) * | 2001-05-14 | 2002-11-26 | Tatsumo Kk | Film formation apparatus |
-
1984
- 1984-03-22 JP JP4148984U patent/JPS60151580U/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002336764A (en) * | 2001-05-14 | 2002-11-26 | Tatsumo Kk | Film formation apparatus |
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