JPH03120555U - - Google Patents
Info
- Publication number
- JPH03120555U JPH03120555U JP2883790U JP2883790U JPH03120555U JP H03120555 U JPH03120555 U JP H03120555U JP 2883790 U JP2883790 U JP 2883790U JP 2883790 U JP2883790 U JP 2883790U JP H03120555 U JPH03120555 U JP H03120555U
- Authority
- JP
- Japan
- Prior art keywords
- substrate holder
- target
- around
- attached
- flat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第１図は本考案に係わる両面スパツタリング装
置の基板ホルダ部の一実施例を示す部分構成図、
第２図は従来例の断面構成図である。
３１……基板ホルダ、３１ａ……歯部、３２…
…基板ホルダに垂直な軸、３３〜３５，３７〜３
９……歯車、３６……ターゲツトに水平な軸。
FIG. 1 is a partial configuration diagram showing an embodiment of the substrate holder part of the double-sided sputtering apparatus according to the present invention;
FIG. 2 is a cross-sectional configuration diagram of a conventional example. 31... Substrate holder, 31a... Teeth, 32...
...Axes perpendicular to the substrate holder, 33-35, 37-3
9...Gear, 36...Axle horizontal to the target.
Claims (1)
グ電極と、前記ターゲツトに垂直な軸を中心にタ
ーゲツトの回りを公転しながらターゲツト面に水
平な回転軸の回りを自転することが可能な基板ホ
ルダと、この基板ホルダに垂直な軸を中心に基板
ホルダを回転できる手段を設け、前記基板ホルダ
に取り付けた平板状の基板の両面に均一膜厚の薄
膜を形成することを特徴とする両面スパツタリン
グ装置。 A sputtering electrode to which a flat target is attached; a substrate holder capable of rotating around a rotational axis horizontal to the target surface while revolving around the target around an axis perpendicular to the target; and this substrate holder. 1. A double-sided sputtering apparatus characterized in that a means for rotating a substrate holder around an axis perpendicular to the substrate holder is provided, and a thin film having a uniform thickness is formed on both sides of a flat substrate attached to the substrate holder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2883790U JPH03120555U (en) | 1990-03-20 | 1990-03-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2883790U JPH03120555U (en) | 1990-03-20 | 1990-03-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03120555U true JPH03120555U (en) | 1991-12-11 |
Family
ID=31531625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2883790U Pending JPH03120555U (en) | 1990-03-20 | 1990-03-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03120555U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101532629B1 (en) * | 2015-05-11 | 2015-06-30 | 이공우 | Contour reducing and massage device for face having movable pressure plate |
-
1990
- 1990-03-20 JP JP2883790U patent/JPH03120555U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101532629B1 (en) * | 2015-05-11 | 2015-06-30 | 이공우 | Contour reducing and massage device for face having movable pressure plate |
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