JPS5679435A - Rotary evaporation device - Google Patents

Rotary evaporation device

Info

Publication number
JPS5679435A
JPS5679435A JP15586179A JP15586179A JPS5679435A JP S5679435 A JPS5679435 A JP S5679435A JP 15586179 A JP15586179 A JP 15586179A JP 15586179 A JP15586179 A JP 15586179A JP S5679435 A JPS5679435 A JP S5679435A
Authority
JP
Japan
Prior art keywords
evaporation
container
substrate
main body
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15586179A
Other languages
Japanese (ja)
Other versions
JPS576684B2 (en
Inventor
Toshinori Urade
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15586179A priority Critical patent/JPS5679435A/en
Publication of JPS5679435A publication Critical patent/JPS5679435A/en
Publication of JPS576684B2 publication Critical patent/JPS576684B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To obtain a uniform evaporation film by a method wherein a container having an evaporation sample is arranged at a central part in a vaccumn vessel, a rotary frame is arranged so as to enclose the container, and the surface of substrate is always faced toward the evaporation sample when a plurality of polygonal supporting frames having the substrate are fixed to the outer circumference of the rotary frame. CONSTITUTION:Evaporation sample container 2 having evaporation sample 3 therein is arranged at a central part of the vaccumn container 1 forming the evaporation, tank, and a double cylindrical rotary frame 8 is positioned on a pair of rollers 7 which encloses the container. Then, a plurality of base plate supporting frame main bodies 11 are attached in the double cylinder part of the frame 8, rotated with the frame 8 to form the evaporation film on the surface of the substrate 5 adhered on the main body 11. With this arrangement, the main body 11 is made to be a polygonal body such as a trihedron or a hexahedron etc. in response to a size of the substrate 5, while a clutch plate is installed at one end of the shaft 10 passing through the main body, and the clutch plate is engaged with a clutch plate at the leading end of a handle arranged outside the container. In this way, only one surface of the polygonal body is always faced toward the evaporation sample 3, and upon completion of the evaporation, the main body 11 is rotated to perform a similar treatment on the substrate 5 in the other face.
JP15586179A 1979-11-30 1979-11-30 Rotary evaporation device Granted JPS5679435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15586179A JPS5679435A (en) 1979-11-30 1979-11-30 Rotary evaporation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15586179A JPS5679435A (en) 1979-11-30 1979-11-30 Rotary evaporation device

Publications (2)

Publication Number Publication Date
JPS5679435A true JPS5679435A (en) 1981-06-30
JPS576684B2 JPS576684B2 (en) 1982-02-06

Family

ID=15615103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15586179A Granted JPS5679435A (en) 1979-11-30 1979-11-30 Rotary evaporation device

Country Status (1)

Country Link
JP (1) JPS5679435A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61125170U (en) * 1984-10-12 1986-08-06
JPH02122074A (en) * 1988-10-03 1990-05-09 Internatl Business Mach Corp <Ibm> Forming layer on substrate and mechanism therefor
JP2002348661A (en) * 2001-05-25 2002-12-04 Kawai Optical Co Ltd Apparatus and method for vapor depositing on face of prism
ITBS20080210A1 (en) * 2008-11-20 2010-05-21 Abl Automazione S P A SUPPORT STRUCTURE FOR ITEMS INTENDED FOR A PROCESS OF PROCESSING, FOR EXAMPLE A PVD OR SPUTTERING METALLIZATION
CN102650040A (en) * 2011-02-23 2012-08-29 三星电子株式会社 Surface coating method and device for exterior part

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61125170U (en) * 1984-10-12 1986-08-06
JPH02122074A (en) * 1988-10-03 1990-05-09 Internatl Business Mach Corp <Ibm> Forming layer on substrate and mechanism therefor
JPH0355550B2 (en) * 1988-10-03 1991-08-23
JP2002348661A (en) * 2001-05-25 2002-12-04 Kawai Optical Co Ltd Apparatus and method for vapor depositing on face of prism
JP4721555B2 (en) * 2001-05-25 2011-07-13 河合光学株式会社 Prism surface deposition apparatus and method
ITBS20080210A1 (en) * 2008-11-20 2010-05-21 Abl Automazione S P A SUPPORT STRUCTURE FOR ITEMS INTENDED FOR A PROCESS OF PROCESSING, FOR EXAMPLE A PVD OR SPUTTERING METALLIZATION
CN102650040A (en) * 2011-02-23 2012-08-29 三星电子株式会社 Surface coating method and device for exterior part
EP2492367A1 (en) * 2011-02-23 2012-08-29 Samsung Electronics Co., Ltd. Surface coating method and device for exterior part

Also Published As

Publication number Publication date
JPS576684B2 (en) 1982-02-06

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