JPS56133455A - Method for reducing amount of chemical copper plating solution - Google Patents
Method for reducing amount of chemical copper plating solutionInfo
- Publication number
- JPS56133455A JPS56133455A JP3625780A JP3625780A JPS56133455A JP S56133455 A JPS56133455 A JP S56133455A JP 3625780 A JP3625780 A JP 3625780A JP 3625780 A JP3625780 A JP 3625780A JP S56133455 A JPS56133455 A JP S56133455A
- Authority
- JP
- Japan
- Prior art keywords
- soln
- tank
- copper plating
- chemical copper
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title abstract 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title abstract 5
- 229910052802 copper Inorganic materials 0.000 title abstract 5
- 239000010949 copper Substances 0.000 title abstract 5
- 239000000126 substance Substances 0.000 title abstract 5
- 238000000034 method Methods 0.000 title 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- 239000003014 ion exchange membrane Substances 0.000 abstract 2
- 230000018044 dehydration Effects 0.000 abstract 1
- 238000006297 dehydration reaction Methods 0.000 abstract 1
- 238000000909 electrodialysis Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
Landscapes
- Chemically Coating (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3625780A JPS56133455A (en) | 1980-03-24 | 1980-03-24 | Method for reducing amount of chemical copper plating solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3625780A JPS56133455A (en) | 1980-03-24 | 1980-03-24 | Method for reducing amount of chemical copper plating solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56133455A true JPS56133455A (en) | 1981-10-19 |
| JPS6411715B2 JPS6411715B2 (enrdf_load_stackoverflow) | 1989-02-27 |
Family
ID=12464714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3625780A Granted JPS56133455A (en) | 1980-03-24 | 1980-03-24 | Method for reducing amount of chemical copper plating solution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56133455A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05306471A (ja) * | 1991-05-17 | 1993-11-19 | Hitachi Kasei Techno Plant Kk | 無電解銅めっき液の生成方法及び生成装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6120629A (ja) * | 1984-07-09 | 1986-01-29 | Hitachi Ltd | バ−リング加工方法 |
-
1980
- 1980-03-24 JP JP3625780A patent/JPS56133455A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6120629A (ja) * | 1984-07-09 | 1986-01-29 | Hitachi Ltd | バ−リング加工方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05306471A (ja) * | 1991-05-17 | 1993-11-19 | Hitachi Kasei Techno Plant Kk | 無電解銅めっき液の生成方法及び生成装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6411715B2 (enrdf_load_stackoverflow) | 1989-02-27 |
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