JPS56127771A - Magnetron sputtering electrode - Google Patents

Magnetron sputtering electrode

Info

Publication number
JPS56127771A
JPS56127771A JP3008980A JP3008980A JPS56127771A JP S56127771 A JPS56127771 A JP S56127771A JP 3008980 A JP3008980 A JP 3008980A JP 3008980 A JP3008980 A JP 3008980A JP S56127771 A JPS56127771 A JP S56127771A
Authority
JP
Japan
Prior art keywords
target
magnetron sputtering
thickness
sputtering electrode
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3008980A
Other languages
Japanese (ja)
Other versions
JPS6138267B2 (en
Inventor
Susumu Kawakami
Koichi Makino
Kazunori Tani
Yoshiichi Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Fujitsu Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Nippon Telegraph and Telephone Corp filed Critical Fujitsu Ltd
Priority to JP3008980A priority Critical patent/JPS56127771A/en
Publication of JPS56127771A publication Critical patent/JPS56127771A/en
Publication of JPS6138267B2 publication Critical patent/JPS6138267B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To produce a film of a highly magnetic material rapidly by a method wherein a magnetic field is generated at the surface of a target and a plasma can be focused even when a ferromagnetic body is used as the target. CONSTITUTION:In the magnetron sputtering electrode provided with the target of the ferromagnetic body and an electromagnet placed below the target, the thickness W11 of a central magnetic core and the thickness W21 of a lateral magnetic core are so designed as to satisfy the formulas, where (t) is the thickness of the target, BTS is the saturation flux density of the target and BMS is the saturation flux density of a yoke. Accordingly, a leakage magnetic field is generated at the target surface and the plasma can be focused, the film of ferromagnetic material is produced. This applies also to a magnetron sputtering electrode provided with a permanent magnet in place of the electromagnet.
JP3008980A 1980-03-10 1980-03-10 Magnetron sputtering electrode Granted JPS56127771A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3008980A JPS56127771A (en) 1980-03-10 1980-03-10 Magnetron sputtering electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3008980A JPS56127771A (en) 1980-03-10 1980-03-10 Magnetron sputtering electrode

Publications (2)

Publication Number Publication Date
JPS56127771A true JPS56127771A (en) 1981-10-06
JPS6138267B2 JPS6138267B2 (en) 1986-08-28

Family

ID=12294057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3008980A Granted JPS56127771A (en) 1980-03-10 1980-03-10 Magnetron sputtering electrode

Country Status (1)

Country Link
JP (1) JPS56127771A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5760538A (en) * 1980-09-26 1982-04-12 Seiko Epson Corp Manufacture for magnetic recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5760538A (en) * 1980-09-26 1982-04-12 Seiko Epson Corp Manufacture for magnetic recording medium
JPH0123857B2 (en) * 1980-09-26 1989-05-09 Seiko Epson Corp

Also Published As

Publication number Publication date
JPS6138267B2 (en) 1986-08-28

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