JPS56123378A - Etching method for electrode base material - Google Patents

Etching method for electrode base material

Info

Publication number
JPS56123378A
JPS56123378A JP2650080A JP2650080A JPS56123378A JP S56123378 A JPS56123378 A JP S56123378A JP 2650080 A JP2650080 A JP 2650080A JP 2650080 A JP2650080 A JP 2650080A JP S56123378 A JPS56123378 A JP S56123378A
Authority
JP
Japan
Prior art keywords
base material
electrode base
etching
heat
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2650080A
Other languages
Japanese (ja)
Other versions
JPS6030744B2 (en
Inventor
Yasutaka Ozaki
Etsuo Azuma
Shunji Matsuura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Priority to JP2650080A priority Critical patent/JPS6030744B2/en
Publication of JPS56123378A publication Critical patent/JPS56123378A/en
Publication of JPS6030744B2 publication Critical patent/JPS6030744B2/en
Expired legal-status Critical Current

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  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE: To afford uniform and sufficient etching effect to an electrode base material by beforehand heat-treating a porous electrode base material then etching the same.
CONSTITUTION: A porous electrode base material which has activated surface partially on its surface or in which stress and strain remain locally is heat-treated prior to etching. After the heat treatment, the electrode base material is immersed in a soln. of a suitable concn. such as hydrochloric acid, perchloric acid, or sulfuric acid as it is or, if necessary, after descaling, pickling, degreasing, etc., whereby it is etched. The etched electrode base material is next washed and dried according to need, and is sent to the next placing process; such as processes of coating of active material, sintering and coating.
COPYRIGHT: (C)1981,JPO&Japio
JP2650080A 1980-03-05 1980-03-05 Electrode substrate etching method Expired JPS6030744B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2650080A JPS6030744B2 (en) 1980-03-05 1980-03-05 Electrode substrate etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2650080A JPS6030744B2 (en) 1980-03-05 1980-03-05 Electrode substrate etching method

Publications (2)

Publication Number Publication Date
JPS56123378A true JPS56123378A (en) 1981-09-28
JPS6030744B2 JPS6030744B2 (en) 1985-07-18

Family

ID=12195202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2650080A Expired JPS6030744B2 (en) 1980-03-05 1980-03-05 Electrode substrate etching method

Country Status (1)

Country Link
JP (1) JPS6030744B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101040768B1 (en) 2008-08-12 2011-06-13 주학식 Fragrance emitting and method for manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101040768B1 (en) 2008-08-12 2011-06-13 주학식 Fragrance emitting and method for manufacturing the same

Also Published As

Publication number Publication date
JPS6030744B2 (en) 1985-07-18

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