JPS5611906A - Photo-insolubilizable polyvinyl alcohol derivative and its preparation - Google Patents

Photo-insolubilizable polyvinyl alcohol derivative and its preparation

Info

Publication number
JPS5611906A
JPS5611906A JP8763779A JP8763779A JPS5611906A JP S5611906 A JPS5611906 A JP S5611906A JP 8763779 A JP8763779 A JP 8763779A JP 8763779 A JP8763779 A JP 8763779A JP S5611906 A JPS5611906 A JP S5611906A
Authority
JP
Japan
Prior art keywords
polyvinyl alcohol
photo
alcohol derivative
insolubilizable
preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8763779A
Other languages
English (en)
Other versions
JPS6254802B2 (ja
Inventor
Kunihiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP8763779A priority Critical patent/JPS5611906A/ja
Publication of JPS5611906A publication Critical patent/JPS5611906A/ja
Publication of JPS6254802B2 publication Critical patent/JPS6254802B2/ja
Granted legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP8763779A 1979-07-11 1979-07-11 Photo-insolubilizable polyvinyl alcohol derivative and its preparation Granted JPS5611906A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8763779A JPS5611906A (en) 1979-07-11 1979-07-11 Photo-insolubilizable polyvinyl alcohol derivative and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8763779A JPS5611906A (en) 1979-07-11 1979-07-11 Photo-insolubilizable polyvinyl alcohol derivative and its preparation

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP20797382A Division JPS59521B2 (ja) 1982-11-26 1982-11-26 光不溶化性感光材料の製造方法

Publications (2)

Publication Number Publication Date
JPS5611906A true JPS5611906A (en) 1981-02-05
JPS6254802B2 JPS6254802B2 (ja) 1987-11-17

Family

ID=13920487

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8763779A Granted JPS5611906A (en) 1979-07-11 1979-07-11 Photo-insolubilizable polyvinyl alcohol derivative and its preparation

Country Status (1)

Country Link
JP (1) JPS5611906A (ja)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58129976A (ja) * 1982-01-27 1983-08-03 Agency Of Ind Science & Technol 微生物菌体の固定化法
US4444868A (en) * 1981-08-06 1984-04-24 Agency Of Industrial Science & Technology Photosensitive composition
JPS59113007A (ja) * 1982-12-18 1984-06-29 Mitsui Toatsu Chem Inc オレフインの共重合方法
JPS59154442A (ja) * 1983-02-22 1984-09-03 Oji Paper Co Ltd 画像形成用感光性フイルム
JPS59185332A (ja) * 1983-04-06 1984-10-20 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS59211037A (ja) * 1983-05-17 1984-11-29 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS6187153A (ja) * 1984-09-11 1986-05-02 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS62109040A (ja) * 1985-11-08 1987-05-20 Nippon Kayaku Co Ltd 感光性樹脂組成物
JPS63100443A (ja) * 1986-10-17 1988-05-02 Nippon Kayaku Co Ltd 可染性樹脂膜のパタ−ン形成法
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
US5807657A (en) * 1995-12-11 1998-09-15 Toyo Gosei Kogyo Co., Ltd. Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the same
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
US6140018A (en) * 1998-08-05 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method
KR20010007228A (ko) * 1999-06-04 2001-01-26 도요 고세이 고교 가부시키가이샤 감광성 비누화된 폴리(비닐 아세테이트)로 구성된 감광성조성물 및 그 조성물을 이용하는 패턴형성방법
US6238841B1 (en) 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
KR20010107288A (ko) * 2000-05-26 2001-12-07 박이순 감광성 수지의 제조 방법
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
US6610791B2 (en) 2000-02-14 2003-08-26 Toyo Gosai Kogyo Co., Ltd. Photosensitive compound and photosensitive resin
US6797452B2 (en) 1999-06-04 2004-09-28 Toyo Gosei Kogyo Co., Ltd. Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition

Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4444868A (en) * 1981-08-06 1984-04-24 Agency Of Industrial Science & Technology Photosensitive composition
JPS6149957B2 (ja) * 1982-01-27 1986-10-31 Kogyo Gijutsuin
JPS58129976A (ja) * 1982-01-27 1983-08-03 Agency Of Ind Science & Technol 微生物菌体の固定化法
JPS59113007A (ja) * 1982-12-18 1984-06-29 Mitsui Toatsu Chem Inc オレフインの共重合方法
JPH0437086B2 (ja) * 1982-12-18 1992-06-18 Mitsui Toatsu Chemicals
JPS59154442A (ja) * 1983-02-22 1984-09-03 Oji Paper Co Ltd 画像形成用感光性フイルム
JPH0336216B2 (ja) * 1983-04-06 1991-05-30 Kogyo Gijutsu Incho
JPS59185332A (ja) * 1983-04-06 1984-10-20 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS59211037A (ja) * 1983-05-17 1984-11-29 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS6187153A (ja) * 1984-09-11 1986-05-02 Agency Of Ind Science & Technol 感光性樹脂組成物
JPH0336423B2 (ja) * 1984-09-11 1991-05-31 Kogyo Gijutsu Incho
JPH0462660B2 (ja) * 1985-11-08 1992-10-07 Nippon Kayaku Kk
JPS62109040A (ja) * 1985-11-08 1987-05-20 Nippon Kayaku Co Ltd 感光性樹脂組成物
JPS63100443A (ja) * 1986-10-17 1988-05-02 Nippon Kayaku Co Ltd 可染性樹脂膜のパタ−ン形成法
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
US5807657A (en) * 1995-12-11 1998-09-15 Toyo Gosei Kogyo Co., Ltd. Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the same
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6475702B2 (en) 1998-03-12 2002-11-05 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6322952B1 (en) 1998-03-12 2001-11-27 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6238841B1 (en) 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6140018A (en) * 1998-08-05 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
KR20010007228A (ko) * 1999-06-04 2001-01-26 도요 고세이 고교 가부시키가이샤 감광성 비누화된 폴리(비닐 아세테이트)로 구성된 감광성조성물 및 그 조성물을 이용하는 패턴형성방법
US6797452B2 (en) 1999-06-04 2004-09-28 Toyo Gosei Kogyo Co., Ltd. Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition
US6610791B2 (en) 2000-02-14 2003-08-26 Toyo Gosai Kogyo Co., Ltd. Photosensitive compound and photosensitive resin
KR20010107288A (ko) * 2000-05-26 2001-12-07 박이순 감광성 수지의 제조 방법

Also Published As

Publication number Publication date
JPS6254802B2 (ja) 1987-11-17

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