JPS5611906A - Photo-insolubilizable polyvinyl alcohol derivative and its preparation - Google Patents
Photo-insolubilizable polyvinyl alcohol derivative and its preparationInfo
- Publication number
- JPS5611906A JPS5611906A JP8763779A JP8763779A JPS5611906A JP S5611906 A JPS5611906 A JP S5611906A JP 8763779 A JP8763779 A JP 8763779A JP 8763779 A JP8763779 A JP 8763779A JP S5611906 A JPS5611906 A JP S5611906A
- Authority
- JP
- Japan
- Prior art keywords
- polyvinyl alcohol
- photo
- alcohol derivative
- insolubilizable
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8763779A JPS5611906A (en) | 1979-07-11 | 1979-07-11 | Photo-insolubilizable polyvinyl alcohol derivative and its preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8763779A JPS5611906A (en) | 1979-07-11 | 1979-07-11 | Photo-insolubilizable polyvinyl alcohol derivative and its preparation |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20797382A Division JPS59521B2 (ja) | 1982-11-26 | 1982-11-26 | 光不溶化性感光材料の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5611906A true JPS5611906A (en) | 1981-02-05 |
JPS6254802B2 JPS6254802B2 (ja) | 1987-11-17 |
Family
ID=13920487
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8763779A Granted JPS5611906A (en) | 1979-07-11 | 1979-07-11 | Photo-insolubilizable polyvinyl alcohol derivative and its preparation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5611906A (ja) |
Cited By (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58129976A (ja) * | 1982-01-27 | 1983-08-03 | Agency Of Ind Science & Technol | 微生物菌体の固定化法 |
US4444868A (en) * | 1981-08-06 | 1984-04-24 | Agency Of Industrial Science & Technology | Photosensitive composition |
JPS59113007A (ja) * | 1982-12-18 | 1984-06-29 | Mitsui Toatsu Chem Inc | オレフインの共重合方法 |
JPS59154442A (ja) * | 1983-02-22 | 1984-09-03 | Oji Paper Co Ltd | 画像形成用感光性フイルム |
JPS59185332A (ja) * | 1983-04-06 | 1984-10-20 | Agency Of Ind Science & Technol | 感光性樹脂組成物 |
JPS59211037A (ja) * | 1983-05-17 | 1984-11-29 | Agency Of Ind Science & Technol | 感光性樹脂組成物 |
JPS6187153A (ja) * | 1984-09-11 | 1986-05-02 | Agency Of Ind Science & Technol | 感光性樹脂組成物 |
JPS62109040A (ja) * | 1985-11-08 | 1987-05-20 | Nippon Kayaku Co Ltd | 感光性樹脂組成物 |
JPS63100443A (ja) * | 1986-10-17 | 1988-05-02 | Nippon Kayaku Co Ltd | 可染性樹脂膜のパタ−ン形成法 |
EP0373537A1 (en) | 1988-12-14 | 1990-06-20 | THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY | Photosensitive poly(vinyl alcohol) derivative |
US5807657A (en) * | 1995-12-11 | 1998-09-15 | Toyo Gosei Kogyo Co., Ltd. | Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the same |
US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
US6136507A (en) * | 1998-03-12 | 2000-10-24 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6140007A (en) * | 1997-04-30 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
US6140018A (en) * | 1998-08-05 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method |
KR20010007228A (ko) * | 1999-06-04 | 2001-01-26 | 도요 고세이 고교 가부시키가이샤 | 감광성 비누화된 폴리(비닐 아세테이트)로 구성된 감광성조성물 및 그 조성물을 이용하는 패턴형성방법 |
US6238841B1 (en) | 1998-05-12 | 2001-05-29 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
KR20010107288A (ko) * | 2000-05-26 | 2001-12-07 | 박이순 | 감광성 수지의 제조 방법 |
US6342330B2 (en) | 1998-09-24 | 2002-01-29 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
US6610791B2 (en) | 2000-02-14 | 2003-08-26 | Toyo Gosai Kogyo Co., Ltd. | Photosensitive compound and photosensitive resin |
US6797452B2 (en) | 1999-06-04 | 2004-09-28 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition |
-
1979
- 1979-07-11 JP JP8763779A patent/JPS5611906A/ja active Granted
Cited By (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4444868A (en) * | 1981-08-06 | 1984-04-24 | Agency Of Industrial Science & Technology | Photosensitive composition |
JPS6149957B2 (ja) * | 1982-01-27 | 1986-10-31 | Kogyo Gijutsuin | |
JPS58129976A (ja) * | 1982-01-27 | 1983-08-03 | Agency Of Ind Science & Technol | 微生物菌体の固定化法 |
JPS59113007A (ja) * | 1982-12-18 | 1984-06-29 | Mitsui Toatsu Chem Inc | オレフインの共重合方法 |
JPH0437086B2 (ja) * | 1982-12-18 | 1992-06-18 | Mitsui Toatsu Chemicals | |
JPS59154442A (ja) * | 1983-02-22 | 1984-09-03 | Oji Paper Co Ltd | 画像形成用感光性フイルム |
JPH0336216B2 (ja) * | 1983-04-06 | 1991-05-30 | Kogyo Gijutsu Incho | |
JPS59185332A (ja) * | 1983-04-06 | 1984-10-20 | Agency Of Ind Science & Technol | 感光性樹脂組成物 |
JPS59211037A (ja) * | 1983-05-17 | 1984-11-29 | Agency Of Ind Science & Technol | 感光性樹脂組成物 |
JPS6187153A (ja) * | 1984-09-11 | 1986-05-02 | Agency Of Ind Science & Technol | 感光性樹脂組成物 |
JPH0336423B2 (ja) * | 1984-09-11 | 1991-05-31 | Kogyo Gijutsu Incho | |
JPH0462660B2 (ja) * | 1985-11-08 | 1992-10-07 | Nippon Kayaku Kk | |
JPS62109040A (ja) * | 1985-11-08 | 1987-05-20 | Nippon Kayaku Co Ltd | 感光性樹脂組成物 |
JPS63100443A (ja) * | 1986-10-17 | 1988-05-02 | Nippon Kayaku Co Ltd | 可染性樹脂膜のパタ−ン形成法 |
EP0373537A1 (en) | 1988-12-14 | 1990-06-20 | THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY | Photosensitive poly(vinyl alcohol) derivative |
US5807657A (en) * | 1995-12-11 | 1998-09-15 | Toyo Gosei Kogyo Co., Ltd. | Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the same |
US6140007A (en) * | 1997-04-30 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
US6136507A (en) * | 1998-03-12 | 2000-10-24 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6475702B2 (en) | 1998-03-12 | 2002-11-05 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6322952B1 (en) | 1998-03-12 | 2001-11-27 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6238841B1 (en) | 1998-05-12 | 2001-05-29 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
US6140018A (en) * | 1998-08-05 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method |
US6342330B2 (en) | 1998-09-24 | 2002-01-29 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
KR20010007228A (ko) * | 1999-06-04 | 2001-01-26 | 도요 고세이 고교 가부시키가이샤 | 감광성 비누화된 폴리(비닐 아세테이트)로 구성된 감광성조성물 및 그 조성물을 이용하는 패턴형성방법 |
US6797452B2 (en) | 1999-06-04 | 2004-09-28 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition |
US6610791B2 (en) | 2000-02-14 | 2003-08-26 | Toyo Gosai Kogyo Co., Ltd. | Photosensitive compound and photosensitive resin |
KR20010107288A (ko) * | 2000-05-26 | 2001-12-07 | 박이순 | 감광성 수지의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
JPS6254802B2 (ja) | 1987-11-17 |
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