JPS56118647A - Flaw inspecting apparatus - Google Patents

Flaw inspecting apparatus

Info

Publication number
JPS56118647A
JPS56118647A JP2155480A JP2155480A JPS56118647A JP S56118647 A JPS56118647 A JP S56118647A JP 2155480 A JP2155480 A JP 2155480A JP 2155480 A JP2155480 A JP 2155480A JP S56118647 A JPS56118647 A JP S56118647A
Authority
JP
Japan
Prior art keywords
flaw
small frame
existence
inspected
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2155480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6256974B2 (enrdf_load_stackoverflow
Inventor
Mitsuyoshi Koizumi
Nobuyuki Akiyama
Yoshimasa Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2155480A priority Critical patent/JPS56118647A/ja
Publication of JPS56118647A publication Critical patent/JPS56118647A/ja
Publication of JPS6256974B2 publication Critical patent/JPS6256974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Closed-Circuit Television Systems (AREA)
JP2155480A 1980-02-25 1980-02-25 Flaw inspecting apparatus Granted JPS56118647A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2155480A JPS56118647A (en) 1980-02-25 1980-02-25 Flaw inspecting apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2155480A JPS56118647A (en) 1980-02-25 1980-02-25 Flaw inspecting apparatus

Publications (2)

Publication Number Publication Date
JPS56118647A true JPS56118647A (en) 1981-09-17
JPS6256974B2 JPS6256974B2 (enrdf_load_stackoverflow) 1987-11-28

Family

ID=12058216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2155480A Granted JPS56118647A (en) 1980-02-25 1980-02-25 Flaw inspecting apparatus

Country Status (1)

Country Link
JP (1) JPS56118647A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59196446A (ja) * 1983-04-22 1984-11-07 Toshiba Corp 不良認識装置
EP0611608A1 (de) * 1993-02-16 1994-08-24 SYSTEM KURANDT GmbH Verfahren und Vorrichtung zum Abtasten und Überprüfen von Spurauftragungen auf einer Unterlage
CN104406517A (zh) * 2014-11-12 2015-03-11 昆山万像光电有限公司 一种多工位镭射平面度扫描量测方法
CN110763690A (zh) * 2019-11-14 2020-02-07 上海精测半导体技术有限公司 一种表面检测装置及方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54133022A (en) * 1978-04-07 1979-10-16 Hitachi Ltd Comparison and inspection system for two dimensional picture
JPS5594147A (en) * 1979-01-12 1980-07-17 Kobe Steel Ltd Method of discriminating surface flaw of high temperature material to be detected

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54133022A (en) * 1978-04-07 1979-10-16 Hitachi Ltd Comparison and inspection system for two dimensional picture
JPS5594147A (en) * 1979-01-12 1980-07-17 Kobe Steel Ltd Method of discriminating surface flaw of high temperature material to be detected

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59196446A (ja) * 1983-04-22 1984-11-07 Toshiba Corp 不良認識装置
EP0611608A1 (de) * 1993-02-16 1994-08-24 SYSTEM KURANDT GmbH Verfahren und Vorrichtung zum Abtasten und Überprüfen von Spurauftragungen auf einer Unterlage
CN104406517A (zh) * 2014-11-12 2015-03-11 昆山万像光电有限公司 一种多工位镭射平面度扫描量测方法
CN110763690A (zh) * 2019-11-14 2020-02-07 上海精测半导体技术有限公司 一种表面检测装置及方法

Also Published As

Publication number Publication date
JPS6256974B2 (enrdf_load_stackoverflow) 1987-11-28

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