JPS5599720A - Method and device of manufacturing semiconductor device - Google Patents

Method and device of manufacturing semiconductor device

Info

Publication number
JPS5599720A
JPS5599720A JP761079A JP761079A JPS5599720A JP S5599720 A JPS5599720 A JP S5599720A JP 761079 A JP761079 A JP 761079A JP 761079 A JP761079 A JP 761079A JP S5599720 A JPS5599720 A JP S5599720A
Authority
JP
Japan
Prior art keywords
mask
doping region
impurity doping
opening
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP761079A
Other languages
English (en)
Inventor
Junichi Nishizawa
Kenji Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Research Foundation
Original Assignee
Semiconductor Research Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Research Foundation filed Critical Semiconductor Research Foundation
Priority to JP761079A priority Critical patent/JPS5599720A/ja
Publication of JPS5599720A publication Critical patent/JPS5599720A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Junction Field-Effect Transistors (AREA)
JP761079A 1979-01-24 1979-01-24 Method and device of manufacturing semiconductor device Pending JPS5599720A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP761079A JPS5599720A (en) 1979-01-24 1979-01-24 Method and device of manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP761079A JPS5599720A (en) 1979-01-24 1979-01-24 Method and device of manufacturing semiconductor device

Publications (1)

Publication Number Publication Date
JPS5599720A true JPS5599720A (en) 1980-07-30

Family

ID=11670569

Family Applications (1)

Application Number Title Priority Date Filing Date
JP761079A Pending JPS5599720A (en) 1979-01-24 1979-01-24 Method and device of manufacturing semiconductor device

Country Status (1)

Country Link
JP (1) JPS5599720A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5832473A (ja) * 1981-08-20 1983-02-25 Matsushita Electric Ind Co Ltd 電界効果トランジスタおよびその製造方法
JPS58191430A (ja) * 1982-04-30 1983-11-08 Matsushita Electric Works Ltd 半導体装置の製法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5832473A (ja) * 1981-08-20 1983-02-25 Matsushita Electric Ind Co Ltd 電界効果トランジスタおよびその製造方法
JPS58191430A (ja) * 1982-04-30 1983-11-08 Matsushita Electric Works Ltd 半導体装置の製法

Similar Documents

Publication Publication Date Title
JPS5599720A (en) Method and device of manufacturing semiconductor device
JPS53147481A (en) Semiconductor device and production of the same
JPS5661139A (en) Manufacture of semiconductor device
JPS55133538A (en) Manufacturing method of semiconductor device
JPS55156369A (en) Manufacture of semiconductor device
JPS5389366A (en) Production of semiconductor device
JPS56126957A (en) Manufacture of semiconductor device
JPS5533037A (en) Manufacture of semiconductor device
JPS5372474A (en) Manufacture for field effect transistor
JPS57173956A (en) Manufacture of semiconductor device
JPS57181137A (en) Manufacture of semiconductor device
JPS5762566A (en) Manufacture of semiconductor device
JPS5459873A (en) Production of semiconductor device
JPS5467773A (en) Production of semiconductor device
JPS644078A (en) Semiconductor storage device and manufacture thereof
JPS649661A (en) Manufacture of semiconductor device
JPS57128067A (en) Manufacture of semiconductor device
JPS5299778A (en) Production of silicon mask for x-ray lithography
JPS5650540A (en) Formation of selectively oxidized separating region
JPS57162471A (en) Semiconductor device and manufacture thereof
JPS5472972A (en) Manufacture of semiconductor device
JPS57180176A (en) Manufacturing method for semiconductor device
JPS55154763A (en) Manufacture of semiconductor device
JPS57139921A (en) Manufacture of semiconductor device
JPS5539611A (en) Manufacturing semiconductor device