JPS5597468A - Ion plating equipment - Google Patents

Ion plating equipment

Info

Publication number
JPS5597468A
JPS5597468A JP425679A JP425679A JPS5597468A JP S5597468 A JPS5597468 A JP S5597468A JP 425679 A JP425679 A JP 425679A JP 425679 A JP425679 A JP 425679A JP S5597468 A JPS5597468 A JP S5597468A
Authority
JP
Japan
Prior art keywords
evaporation source
gas
evaporating material
ion plating
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP425679A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6139394B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Etsuo Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP425679A priority Critical patent/JPS5597468A/ja
Publication of JPS5597468A publication Critical patent/JPS5597468A/ja
Publication of JPS6139394B2 publication Critical patent/JPS6139394B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP425679A 1979-01-17 1979-01-17 Ion plating equipment Granted JPS5597468A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP425679A JPS5597468A (en) 1979-01-17 1979-01-17 Ion plating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP425679A JPS5597468A (en) 1979-01-17 1979-01-17 Ion plating equipment

Publications (2)

Publication Number Publication Date
JPS5597468A true JPS5597468A (en) 1980-07-24
JPS6139394B2 JPS6139394B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-09-03

Family

ID=11579451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP425679A Granted JPS5597468A (en) 1979-01-17 1979-01-17 Ion plating equipment

Country Status (1)

Country Link
JP (1) JPS5597468A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55144391A (en) * 1979-04-25 1980-11-11 Toshiba Corp Pipe working method
JP2022546072A (ja) * 2019-08-30 2022-11-02 ダイソン・テクノロジー・リミテッド 堆積システム

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55144391A (en) * 1979-04-25 1980-11-11 Toshiba Corp Pipe working method
JP2022546072A (ja) * 2019-08-30 2022-11-02 ダイソン・テクノロジー・リミテッド 堆積システム

Also Published As

Publication number Publication date
JPS6139394B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1986-09-03

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