JPS5596640A - Method of forming glass film on semiconductor substrate - Google Patents
Method of forming glass film on semiconductor substrateInfo
- Publication number
- JPS5596640A JPS5596640A JP397179A JP397179A JPS5596640A JP S5596640 A JPS5596640 A JP S5596640A JP 397179 A JP397179 A JP 397179A JP 397179 A JP397179 A JP 397179A JP S5596640 A JPS5596640 A JP S5596640A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- substrate
- film
- layer
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To obtain a glass film on a semiconductor substrate by superimposing a glass particle layer and a photo resist layer sequentially on the substrate, selectively exposing and developing, and heating to fuse the layers.
CONSTITUTION: A mesa groove reaching a pn junction is provided around an element region formed on a silicon substrate 1, and a glass particle layer 4 is selectively formed at the groove according to an electrophoresis. At this time unnecessary glass 5 is adhered also on the SiO2 film. Then, photo resist is coated on the substrate, exposed and developed to selectively form a resist layer 6. Since the unnecessary glass 5 has weak adhesion with the SiO2 film, it is removed at developing time. Then, the layer 6 is burnt ash by a plasma, and thus removed to thus complete formation of the glass on the substrate by heating to fuse the glass particle layer 4.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP397179A JPS5596640A (en) | 1979-01-19 | 1979-01-19 | Method of forming glass film on semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP397179A JPS5596640A (en) | 1979-01-19 | 1979-01-19 | Method of forming glass film on semiconductor substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5596640A true JPS5596640A (en) | 1980-07-23 |
Family
ID=11571950
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP397179A Pending JPS5596640A (en) | 1979-01-19 | 1979-01-19 | Method of forming glass film on semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5596640A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017135094A1 (en) * | 2016-02-05 | 2017-08-10 | 新電元工業株式会社 | Method for producing semiconductor device |
JP6396598B1 (en) * | 2017-04-19 | 2018-09-26 | 新電元工業株式会社 | Manufacturing method of semiconductor device |
-
1979
- 1979-01-19 JP JP397179A patent/JPS5596640A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017135094A1 (en) * | 2016-02-05 | 2017-08-10 | 新電元工業株式会社 | Method for producing semiconductor device |
JP6235190B1 (en) * | 2016-02-05 | 2017-11-22 | 新電元工業株式会社 | Manufacturing method of semiconductor device |
JP6396598B1 (en) * | 2017-04-19 | 2018-09-26 | 新電元工業株式会社 | Manufacturing method of semiconductor device |
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