JPS559510A - Heat resistant photoresist composition - Google Patents
Heat resistant photoresist compositionInfo
- Publication number
- JPS559510A JPS559510A JP8144878A JP8144878A JPS559510A JP S559510 A JPS559510 A JP S559510A JP 8144878 A JP8144878 A JP 8144878A JP 8144878 A JP8144878 A JP 8144878A JP S559510 A JPS559510 A JP S559510A
- Authority
- JP
- Japan
- Prior art keywords
- aromatic
- compounds
- polyamide acid
- polymer
- cinnamate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 2
- -1 aromatic diamide compound Chemical class 0.000 abstract 3
- 239000002253 acid Substances 0.000 abstract 2
- 239000004760 aramid Substances 0.000 abstract 2
- 229920003235 aromatic polyamide Polymers 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 abstract 1
- 150000008425 anthrones Chemical class 0.000 abstract 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 abstract 1
- 150000008365 aromatic ketones Chemical class 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- JUVGLPRIQOJMIR-UHFFFAOYSA-N oxiran-2-ylmethyl 3-phenylprop-2-enoate Chemical compound C=1C=CC=CC=1C=CC(=O)OCC1CO1 JUVGLPRIQOJMIR-UHFFFAOYSA-N 0.000 abstract 1
- 150000002989 phenols Chemical class 0.000 abstract 1
- 239000003495 polar organic solvent Substances 0.000 abstract 1
- 238000001556 precipitation Methods 0.000 abstract 1
- 239000000047 product Substances 0.000 abstract 1
- 150000004053 quinones Chemical class 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 238000000926 separation method Methods 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical group [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 abstract 1
Landscapes
- Formation Of Insulating Films (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8144878A JPS559510A (en) | 1978-07-06 | 1978-07-06 | Heat resistant photoresist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8144878A JPS559510A (en) | 1978-07-06 | 1978-07-06 | Heat resistant photoresist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS559510A true JPS559510A (en) | 1980-01-23 |
| JPH0145051B2 JPH0145051B2 (enrdf_load_stackoverflow) | 1989-10-02 |
Family
ID=13746672
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8144878A Granted JPS559510A (en) | 1978-07-06 | 1978-07-06 | Heat resistant photoresist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS559510A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63318549A (ja) * | 1987-06-22 | 1988-12-27 | Hitachi Ltd | 耐熱感光性重合体組成物 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54116217A (en) * | 1978-03-01 | 1979-09-10 | Toray Industries | Heat resistant lightsensitive material |
-
1978
- 1978-07-06 JP JP8144878A patent/JPS559510A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54116217A (en) * | 1978-03-01 | 1979-09-10 | Toray Industries | Heat resistant lightsensitive material |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63318549A (ja) * | 1987-06-22 | 1988-12-27 | Hitachi Ltd | 耐熱感光性重合体組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0145051B2 (enrdf_load_stackoverflow) | 1989-10-02 |
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