JPS54116217A - Heat resistant lightsensitive material - Google Patents
Heat resistant lightsensitive materialInfo
- Publication number
- JPS54116217A JPS54116217A JP2203578A JP2203578A JPS54116217A JP S54116217 A JPS54116217 A JP S54116217A JP 2203578 A JP2203578 A JP 2203578A JP 2203578 A JP2203578 A JP 2203578A JP S54116217 A JPS54116217 A JP S54116217A
- Authority
- JP
- Japan
- Prior art keywords
- heat resistant
- lightsensitive material
- lightsensitive
- resistant
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Polyamides (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2203578A JPS6046421B2 (en) | 1978-03-01 | 1978-03-01 | Heat-resistant photosensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2203578A JPS6046421B2 (en) | 1978-03-01 | 1978-03-01 | Heat-resistant photosensitive material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54116217A true JPS54116217A (en) | 1979-09-10 |
JPS6046421B2 JPS6046421B2 (en) | 1985-10-16 |
Family
ID=12071695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2203578A Expired JPS6046421B2 (en) | 1978-03-01 | 1978-03-01 | Heat-resistant photosensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6046421B2 (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS559510A (en) * | 1978-07-06 | 1980-01-23 | Asahi Chem Ind Co Ltd | Heat resistant photoresist composition |
WO1980000706A1 (en) * | 1978-09-29 | 1980-04-17 | Hitachi Ltd | Light-sensitive polymer composition |
JPS5635132A (en) * | 1979-08-21 | 1981-04-07 | Siemens Ag | Producing high heattstability relief structure |
JPS59108031A (en) * | 1982-12-13 | 1984-06-22 | Ube Ind Ltd | Photosensitive polyimide |
JPS59210939A (en) * | 1983-05-13 | 1984-11-29 | Toyobo Co Ltd | Crosslinked polyether imide molding |
JPS60100143A (en) * | 1983-08-29 | 1985-06-04 | マイクロサイ,インコーポレイテッド | Optically patternizable dielectric composition and method ofmanufacturing and using same |
JPS60198537A (en) * | 1984-01-24 | 1985-10-08 | ゼネラル・エレクトリツク・カンパニイ | Photopatternable dielectric composition and methods of manufacturing and using the same |
JPS6173740A (en) * | 1984-09-20 | 1986-04-15 | Asahi Chem Ind Co Ltd | Photosensitive composition |
JPS61118423A (en) * | 1984-11-14 | 1986-06-05 | Asahi Chem Ind Co Ltd | Photo-sensitive composition |
JPS61254605A (en) * | 1985-05-07 | 1986-11-12 | Asahi Chem Ind Co Ltd | Photosensitive composition |
JPS62127840A (en) * | 1985-11-29 | 1987-06-10 | Asahi Chem Ind Co Ltd | Photosensitive composition |
EP0424940A2 (en) | 1989-10-27 | 1991-05-02 | Nissan Chemical Industries Ltd. | Positive photosensitive polyimide resin composition |
US6677099B1 (en) | 1999-11-30 | 2004-01-13 | Nissan Chemical Industries, Ltd. | Positive type photosensitive polyimide resin composition |
US6875554B2 (en) | 2000-10-04 | 2005-04-05 | Nissan Chemical Industries, Ltd. | Positive photosensitive polyimide resin composition |
-
1978
- 1978-03-01 JP JP2203578A patent/JPS6046421B2/en not_active Expired
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0145051B2 (en) * | 1978-07-06 | 1989-10-02 | Asahi Chemical Ind | |
JPS559510A (en) * | 1978-07-06 | 1980-01-23 | Asahi Chem Ind Co Ltd | Heat resistant photoresist composition |
WO1980000706A1 (en) * | 1978-09-29 | 1980-04-17 | Hitachi Ltd | Light-sensitive polymer composition |
JPS5635132A (en) * | 1979-08-21 | 1981-04-07 | Siemens Ag | Producing high heattstability relief structure |
JPH0219943B2 (en) * | 1979-08-21 | 1990-05-07 | Siemens Ag | |
JPS59108031A (en) * | 1982-12-13 | 1984-06-22 | Ube Ind Ltd | Photosensitive polyimide |
JPS59210939A (en) * | 1983-05-13 | 1984-11-29 | Toyobo Co Ltd | Crosslinked polyether imide molding |
JPS60100143A (en) * | 1983-08-29 | 1985-06-04 | マイクロサイ,インコーポレイテッド | Optically patternizable dielectric composition and method ofmanufacturing and using same |
JPS60198537A (en) * | 1984-01-24 | 1985-10-08 | ゼネラル・エレクトリツク・カンパニイ | Photopatternable dielectric composition and methods of manufacturing and using the same |
JPS6173740A (en) * | 1984-09-20 | 1986-04-15 | Asahi Chem Ind Co Ltd | Photosensitive composition |
JPS61118423A (en) * | 1984-11-14 | 1986-06-05 | Asahi Chem Ind Co Ltd | Photo-sensitive composition |
JPS61254605A (en) * | 1985-05-07 | 1986-11-12 | Asahi Chem Ind Co Ltd | Photosensitive composition |
JPS62127840A (en) * | 1985-11-29 | 1987-06-10 | Asahi Chem Ind Co Ltd | Photosensitive composition |
EP0424940A2 (en) | 1989-10-27 | 1991-05-02 | Nissan Chemical Industries Ltd. | Positive photosensitive polyimide resin composition |
US6677099B1 (en) | 1999-11-30 | 2004-01-13 | Nissan Chemical Industries, Ltd. | Positive type photosensitive polyimide resin composition |
US6875554B2 (en) | 2000-10-04 | 2005-04-05 | Nissan Chemical Industries, Ltd. | Positive photosensitive polyimide resin composition |
Also Published As
Publication number | Publication date |
---|---|
JPS6046421B2 (en) | 1985-10-16 |
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