JPH0145051B2 - - Google Patents

Info

Publication number
JPH0145051B2
JPH0145051B2 JP53081448A JP8144878A JPH0145051B2 JP H0145051 B2 JPH0145051 B2 JP H0145051B2 JP 53081448 A JP53081448 A JP 53081448A JP 8144878 A JP8144878 A JP 8144878A JP H0145051 B2 JPH0145051 B2 JP H0145051B2
Authority
JP
Japan
Prior art keywords
aromatic
acid
carbonamide
sulfonamide
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53081448A
Other languages
English (en)
Japanese (ja)
Other versions
JPS559510A (en
Inventor
Kaoru Oomura
Takeo Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP8144878A priority Critical patent/JPS559510A/ja
Publication of JPS559510A publication Critical patent/JPS559510A/ja
Publication of JPH0145051B2 publication Critical patent/JPH0145051B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP8144878A 1978-07-06 1978-07-06 Heat resistant photoresist composition Granted JPS559510A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8144878A JPS559510A (en) 1978-07-06 1978-07-06 Heat resistant photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8144878A JPS559510A (en) 1978-07-06 1978-07-06 Heat resistant photoresist composition

Publications (2)

Publication Number Publication Date
JPS559510A JPS559510A (en) 1980-01-23
JPH0145051B2 true JPH0145051B2 (enrdf_load_stackoverflow) 1989-10-02

Family

ID=13746672

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8144878A Granted JPS559510A (en) 1978-07-06 1978-07-06 Heat resistant photoresist composition

Country Status (1)

Country Link
JP (1) JPS559510A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0646302B2 (ja) * 1987-06-22 1994-06-15 株式会社日立製作所 耐熱感光性重合体組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046421B2 (ja) * 1978-03-01 1985-10-16 東レ株式会社 耐熱性感光材料

Also Published As

Publication number Publication date
JPS559510A (en) 1980-01-23

Similar Documents

Publication Publication Date Title
EP0020773B1 (en) Light-sensitive polymer composition
JP5216179B2 (ja) ネガ型感光性ポリイミド組成物及びそれを用いた画像の形成方法
EP0478321B1 (en) Photosenstive resin composition for forming polyimide film pattern and method of forming polyimide film pattern
US4180404A (en) Heat resistant photoresist composition and process for preparing the same
Kubota et al. Preparation of positive photoreactive polyimides and their characterization
US5177181A (en) Diamines and photosensitive polyimides made therefrom
JPH0253779B2 (enrdf_load_stackoverflow)
JP3064579B2 (ja) パターン形成方法
US5320935A (en) Method of forming a pattern from a photosensitive heat-resistant poly(amide)imide having hydroxyphenyl groups
JPS606365B2 (ja) 感光性重合体組成物
JPS606729A (ja) 有機溶媒に可溶性の感光性ポリイミド
EP0137655A2 (en) Radiation-sensitive polymer composition
JPH03186847A (ja) 感光性樹脂組成物
JPH0658534B2 (ja) 化学線感応性重合体組成物
JPH0145051B2 (enrdf_load_stackoverflow)
US5026788A (en) Photosensitive polymer having thiol group
JPS6116971B2 (enrdf_load_stackoverflow)
JPS5950050B2 (ja) 耐熱性フオトレジスト組成物およびその製造法
JP2003295431A (ja) 感光性樹脂組成物およびその製造方法
JPS6054666B2 (ja) 耐熱性フオトレジスト組成物およびその製造法
JPS59100135A (ja) 樹脂組成物
JPH0344107B2 (enrdf_load_stackoverflow)
JPH05310933A (ja) 溶媒可溶性ポリイミドの製造方法
JP2540926B2 (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JP2000250209A (ja) 感光性樹脂組成物およびその製造方法