JPS5588371A - Preparation of schottky barrier diode using gallium arsenide - Google Patents

Preparation of schottky barrier diode using gallium arsenide

Info

Publication number
JPS5588371A
JPS5588371A JP16602178A JP16602178A JPS5588371A JP S5588371 A JPS5588371 A JP S5588371A JP 16602178 A JP16602178 A JP 16602178A JP 16602178 A JP16602178 A JP 16602178A JP S5588371 A JPS5588371 A JP S5588371A
Authority
JP
Japan
Prior art keywords
substrate
protecting film
gallium arsenide
main component
gallium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16602178A
Other languages
Japanese (ja)
Inventor
Yasoo Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP16602178A priority Critical patent/JPS5588371A/en
Publication of JPS5588371A publication Critical patent/JPS5588371A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To stabilize the state of a boundary face between a substrate and a protecting film and prevent the drop of reverse withstanding voltage by growing a surface protecting film whose main component is arsenic or gallium on a gallium arsenide substrate on which electrodes are formed.
CONSTITUTION: After forming an epitaxial layer 11 on a gallium arsenide substrate 10, etching grooves 12 are cut to form a mesa part 13, and further, in the etching grooves 12 and on the top of the mesa part, ohmic electrodes 15 and a Schottky electrode 14 are formed respectively, Next, a surface protecting film 16 whose main component is arsenic oxides is formed on the substrate 10 by the methods of plasma oxidation, thermal oxidation in hydrogen peroxide solution, etc. The surface protecting film 16 may be that whose main component is gallium oxides formed by anodic oxidation method. Then coating polyimide resin 17 and forming contact electrodes 18, the substrate 10 is formed into a prescribed form by etching.
COPYRIGHT: (C)1980,JPO&Japio
JP16602178A 1978-12-26 1978-12-26 Preparation of schottky barrier diode using gallium arsenide Pending JPS5588371A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16602178A JPS5588371A (en) 1978-12-26 1978-12-26 Preparation of schottky barrier diode using gallium arsenide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16602178A JPS5588371A (en) 1978-12-26 1978-12-26 Preparation of schottky barrier diode using gallium arsenide

Publications (1)

Publication Number Publication Date
JPS5588371A true JPS5588371A (en) 1980-07-04

Family

ID=15823443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16602178A Pending JPS5588371A (en) 1978-12-26 1978-12-26 Preparation of schottky barrier diode using gallium arsenide

Country Status (1)

Country Link
JP (1) JPS5588371A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0538682A2 (en) * 1991-10-25 1993-04-28 International Business Machines Corporation Oxygen assisted ohmic contact formation to N-type gallium arsenide
JPH06176211A (en) * 1992-09-14 1994-06-24 Teiriyou Sangyo Kk Identification code paper
JPH07146910A (en) * 1993-06-25 1995-06-06 Teiriyou Sangyo Kk Optical readable binary code
CN103245612A (en) * 2012-02-13 2013-08-14 台湾积体电路制造股份有限公司 Biological sensing structures and methods of forming the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0538682A2 (en) * 1991-10-25 1993-04-28 International Business Machines Corporation Oxygen assisted ohmic contact formation to N-type gallium arsenide
EP0538682A3 (en) * 1991-10-25 1994-01-19 Ibm
US5317190A (en) * 1991-10-25 1994-05-31 International Business Machines Corporation Oxygen assisted ohmic contact formation to N-type gallium arsenide
JPH06176211A (en) * 1992-09-14 1994-06-24 Teiriyou Sangyo Kk Identification code paper
JPH07146910A (en) * 1993-06-25 1995-06-06 Teiriyou Sangyo Kk Optical readable binary code
CN103245612A (en) * 2012-02-13 2013-08-14 台湾积体电路制造股份有限公司 Biological sensing structures and methods of forming the same

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