JPS5583231A - Exposure method - Google Patents
Exposure methodInfo
- Publication number
- JPS5583231A JPS5583231A JP15835078A JP15835078A JPS5583231A JP S5583231 A JPS5583231 A JP S5583231A JP 15835078 A JP15835078 A JP 15835078A JP 15835078 A JP15835078 A JP 15835078A JP S5583231 A JPS5583231 A JP S5583231A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- substrate
- pattern
- warp
- corrected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To form a fine live pattern by a method wherein a substrate is exposed while being corrected for warp by being pressed with photomask on supporting base.
CONSTITUTION: Warp of substrate 5 is corrected by being prened between the support base 11 and the photomask 12. By projecting light on the photomask 12, the resist film 7 on top of the layer 6 of the substrate 5 is exposed according to the pattern on the bottom surface of the photomask. The bottom surface of the substrate 5 is either placed on or bonded to the support base 11 with an adhesive. The method can provide a 1μm live width pattern with high yields and allows the use of thin substrates which otherwise are expensive.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15835078A JPS5583231A (en) | 1978-12-19 | 1978-12-19 | Exposure method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15835078A JPS5583231A (en) | 1978-12-19 | 1978-12-19 | Exposure method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5583231A true JPS5583231A (en) | 1980-06-23 |
Family
ID=15669720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15835078A Pending JPS5583231A (en) | 1978-12-19 | 1978-12-19 | Exposure method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5583231A (en) |
-
1978
- 1978-12-19 JP JP15835078A patent/JPS5583231A/en active Pending
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