JPS5579870A - Evaporation apparatus for substance in vacuum - Google Patents
Evaporation apparatus for substance in vacuumInfo
- Publication number
- JPS5579870A JPS5579870A JP15468878A JP15468878A JPS5579870A JP S5579870 A JPS5579870 A JP S5579870A JP 15468878 A JP15468878 A JP 15468878A JP 15468878 A JP15468878 A JP 15468878A JP S5579870 A JPS5579870 A JP S5579870A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- filament
- ion
- electron
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008020 evaporation Effects 0.000 title abstract 4
- 238000001704 evaporation Methods 0.000 title abstract 4
- 239000000126 substance Substances 0.000 title abstract 2
- 239000000463 material Substances 0.000 abstract 4
- 238000005040 ion trap Methods 0.000 abstract 2
- 230000002159 abnormal effect Effects 0.000 abstract 1
- 230000005684 electric field Effects 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 239000012495 reaction gas Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15468878A JPS5579870A (en) | 1978-12-14 | 1978-12-14 | Evaporation apparatus for substance in vacuum |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15468878A JPS5579870A (en) | 1978-12-14 | 1978-12-14 | Evaporation apparatus for substance in vacuum |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5579870A true JPS5579870A (en) | 1980-06-16 |
JPS5614746B2 JPS5614746B2 (enrdf_load_stackoverflow) | 1981-04-06 |
Family
ID=15589745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15468878A Granted JPS5579870A (en) | 1978-12-14 | 1978-12-14 | Evaporation apparatus for substance in vacuum |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5579870A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004192903A (ja) * | 2002-12-10 | 2004-07-08 | Prazmatec:Kk | 電子銃 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62132814U (enrdf_load_stackoverflow) * | 1986-02-17 | 1987-08-21 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54140064U (enrdf_load_stackoverflow) * | 1978-03-23 | 1979-09-28 | ||
JPS54140065U (enrdf_load_stackoverflow) * | 1978-03-23 | 1979-09-28 |
-
1978
- 1978-12-14 JP JP15468878A patent/JPS5579870A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54140064U (enrdf_load_stackoverflow) * | 1978-03-23 | 1979-09-28 | ||
JPS54140065U (enrdf_load_stackoverflow) * | 1978-03-23 | 1979-09-28 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004192903A (ja) * | 2002-12-10 | 2004-07-08 | Prazmatec:Kk | 電子銃 |
Also Published As
Publication number | Publication date |
---|---|
JPS5614746B2 (enrdf_load_stackoverflow) | 1981-04-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4381453A (en) | System and method for deflecting and focusing a broad ion beam | |
US3046936A (en) | Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof | |
US4541890A (en) | Hall ion generator for working surfaces with a low energy high intensity ion beam | |
JPH07501654A (ja) | 帯電粒子の加速方法および粒子加速器 | |
US4471224A (en) | Apparatus and method for generating high current negative ions | |
JPS63308854A (ja) | イオン源装置 | |
Probyn | A low-energy ion source for the deposition of chromium | |
Franks | FAB: The fast atomic beam source | |
JPH0456761A (ja) | 薄膜形成装置 | |
JPS5579870A (en) | Evaporation apparatus for substance in vacuum | |
JP3272441B2 (ja) | イオン加速装置 | |
US4939425A (en) | Four-electrode ion source | |
JPS54124879A (en) | Ion beam deposition | |
US3514666A (en) | Charged particle generator yielding a mono-energetic ion beam | |
JP2637948B2 (ja) | ビームプラズマ型イオン銃 | |
JPH09256148A (ja) | イオンプレーティング装置 | |
JPS6347226B2 (enrdf_load_stackoverflow) | ||
GB1410262A (en) | Field optical systems | |
SU300079A1 (ru) | Устройство дл нанесени покрытий в вакууме | |
EP0095879B1 (en) | Apparatus and method for working surfaces with a low energy high intensity ion beam | |
RU1802551C (ru) | Способ ионно-лучевого нанесения покрытий | |
JP3247159B2 (ja) | 電子線加熱蒸着装置 | |
JPS5871549A (ja) | イオン源 | |
JPS616271A (ja) | バイアスイオンプレ−テイング方法および装置 | |
JPS5868856A (ja) | イオン源 |