JPS5571616A - Vapor phase growing treatment method - Google Patents

Vapor phase growing treatment method

Info

Publication number
JPS5571616A
JPS5571616A JP14309978A JP14309978A JPS5571616A JP S5571616 A JPS5571616 A JP S5571616A JP 14309978 A JP14309978 A JP 14309978A JP 14309978 A JP14309978 A JP 14309978A JP S5571616 A JPS5571616 A JP S5571616A
Authority
JP
Japan
Prior art keywords
tube
film
heating element
vapor phase
phase growing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14309978A
Other languages
Japanese (ja)
Inventor
Toshihiko Fukuyama
Shintaro Yanagisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP14309978A priority Critical patent/JPS5571616A/en
Publication of JPS5571616A publication Critical patent/JPS5571616A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a uniform-thickness film on the inside of a reaction tube with a simple device by heating the outside of the tube with a heating element moving along the longitudinal direction while feeding a desired film forming gas into the tube. CONSTITUTION:The vapor phase growing device is composed of reaction tube 31 made of quartz or silicon carbide, heating element 37, heating element support 38, driving unit 40, rotary shaft 41, etc. Tube 31 is evacuated with an exhaust unit and heated by moving element 37 along the outside of tube 31 in the longitudinal direction by the action of unit 40, shaft 41, support 38, etc. while feeding a desired reaction gas from gas source 34 through valve 33, thereby uniformly forming a silicon dioxide film, a silicon nitride film, a phosphosilicate glass film, a polycrystal silicon film, or other film on the inside of tube 31.
JP14309978A 1978-11-20 1978-11-20 Vapor phase growing treatment method Pending JPS5571616A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14309978A JPS5571616A (en) 1978-11-20 1978-11-20 Vapor phase growing treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14309978A JPS5571616A (en) 1978-11-20 1978-11-20 Vapor phase growing treatment method

Publications (1)

Publication Number Publication Date
JPS5571616A true JPS5571616A (en) 1980-05-29

Family

ID=15330880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14309978A Pending JPS5571616A (en) 1978-11-20 1978-11-20 Vapor phase growing treatment method

Country Status (1)

Country Link
JP (1) JPS5571616A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6390828U (en) * 1986-12-03 1988-06-13
KR100864258B1 (en) * 2007-02-27 2008-10-17 (주)지원테크 Method of cleaning glassy material product and cleaning apparatus for glassy material product

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6390828U (en) * 1986-12-03 1988-06-13
KR100864258B1 (en) * 2007-02-27 2008-10-17 (주)지원테크 Method of cleaning glassy material product and cleaning apparatus for glassy material product

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