JPS5553424A - Pattern inspection - Google Patents

Pattern inspection

Info

Publication number
JPS5553424A
JPS5553424A JP12709078A JP12709078A JPS5553424A JP S5553424 A JPS5553424 A JP S5553424A JP 12709078 A JP12709078 A JP 12709078A JP 12709078 A JP12709078 A JP 12709078A JP S5553424 A JPS5553424 A JP S5553424A
Authority
JP
Japan
Prior art keywords
base plate
pattern
conducting layer
distribution
transmitted light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12709078A
Other languages
Japanese (ja)
Other versions
JPS5856403B2 (en
Inventor
Yushi Inagaki
Moritoshi Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP53127090A priority Critical patent/JPS5856403B2/en
Publication of JPS5553424A publication Critical patent/JPS5553424A/en
Publication of JPS5856403B2 publication Critical patent/JPS5856403B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE: To enable to perform inspection of fine patterns on which visual inspection is impossible, by scanning a pattern of a conducting layer formed on a printed base by using a light beam of a small spot diameter, and inspecting the distribution of the intensity of this transmitted light.
CONSTITUTION: Printed base plate 1 on which a conduction pattern is formed bridges base plate moving means 4a and 4b which are placed at a distance and which can move. Laser beam source 2 is mounted on this. Beam detector 3 is provided on the back of base plate 1 at the midpoint between 4a and 4b. This is connected to a transmitted light strength distribution forming means consisting of high bandpass filter 5, comparators 6 and 7, counter 8 and clock signal source 8. In this structure, base plate 1, while being illuminated by a beam spot from beam source 2, is moved in one direction, and the beam which has passed base plate 1 is detected by beam detector 3. Subsequently, by turning back base plate 1, the light intensity distribution with respect to the pattern on both surfaces is obtained, and the line width of the conducting layer is calculated.
COPYRIGHT: (C)1980,JPO&Japio
JP53127090A 1978-10-16 1978-10-16 Pattern inspection method Expired JPS5856403B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53127090A JPS5856403B2 (en) 1978-10-16 1978-10-16 Pattern inspection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53127090A JPS5856403B2 (en) 1978-10-16 1978-10-16 Pattern inspection method

Publications (2)

Publication Number Publication Date
JPS5553424A true JPS5553424A (en) 1980-04-18
JPS5856403B2 JPS5856403B2 (en) 1983-12-14

Family

ID=14951326

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53127090A Expired JPS5856403B2 (en) 1978-10-16 1978-10-16 Pattern inspection method

Country Status (1)

Country Link
JP (1) JPS5856403B2 (en)

Also Published As

Publication number Publication date
JPS5856403B2 (en) 1983-12-14

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