JPS5553418A - Semiconductor wafer positioning - Google Patents

Semiconductor wafer positioning

Info

Publication number
JPS5553418A
JPS5553418A JP12707978A JP12707978A JPS5553418A JP S5553418 A JPS5553418 A JP S5553418A JP 12707978 A JP12707978 A JP 12707978A JP 12707978 A JP12707978 A JP 12707978A JP S5553418 A JPS5553418 A JP S5553418A
Authority
JP
Japan
Prior art keywords
wafer
positioning
coordinate axes
semiconductor wafer
facet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12707978A
Other languages
Japanese (ja)
Other versions
JPS5910577B2 (en
Inventor
Takayuki Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12707978A priority Critical patent/JPS5910577B2/en
Publication of JPS5553418A publication Critical patent/JPS5553418A/en
Publication of JPS5910577B2 publication Critical patent/JPS5910577B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To reduce positioning time remarkably by scanning a semiconductor wafer with an electron beam and automatically fitting the positions of the wafer coordinate axes and the beam coordinate axes.
CONSTITUTION: Semiconductor wafer 10, with its facet 11 as reference, is set on the stage of an exposure device. Facet 11 and beam coordinate axis OX are set in parallel. Next, positioning marks on chips 13, 14 on wafer 10 are scanned from o in the direction of x along scanning line 12 in the direction of X of the electron beam, and the intersections R1, S1 of positioning marks A1B1, A1C1 are detected. Then, the coordinates of point P1 lying on the line which is perpendicular to and divides the distance R1S1 into equal parts and is 1/2 of R1S1 are calculated. Subsequently, chip 14 is scanned, and similar point P2 is obtained. From these, the angle of rotation α between the wafer coordinate axis o'x' and the beam coordination axis ox is calculated. Positioning is operated so that the beam coordinate axes and the wafer coordinate axes become parallel to one another. By this, positioning time can be reduced remarkably.
COPYRIGHT: (C)1980,JPO&Japio
JP12707978A 1978-10-16 1978-10-16 How to align semiconductor wafers Expired JPS5910577B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12707978A JPS5910577B2 (en) 1978-10-16 1978-10-16 How to align semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12707978A JPS5910577B2 (en) 1978-10-16 1978-10-16 How to align semiconductor wafers

Publications (2)

Publication Number Publication Date
JPS5553418A true JPS5553418A (en) 1980-04-18
JPS5910577B2 JPS5910577B2 (en) 1984-03-09

Family

ID=14951045

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12707978A Expired JPS5910577B2 (en) 1978-10-16 1978-10-16 How to align semiconductor wafers

Country Status (1)

Country Link
JP (1) JPS5910577B2 (en)

Also Published As

Publication number Publication date
JPS5910577B2 (en) 1984-03-09

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