JPS5553418A - Semiconductor wafer positioning - Google Patents
Semiconductor wafer positioningInfo
- Publication number
- JPS5553418A JPS5553418A JP12707978A JP12707978A JPS5553418A JP S5553418 A JPS5553418 A JP S5553418A JP 12707978 A JP12707978 A JP 12707978A JP 12707978 A JP12707978 A JP 12707978A JP S5553418 A JPS5553418 A JP S5553418A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- positioning
- coordinate axes
- semiconductor wafer
- facet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To reduce positioning time remarkably by scanning a semiconductor wafer with an electron beam and automatically fitting the positions of the wafer coordinate axes and the beam coordinate axes.
CONSTITUTION: Semiconductor wafer 10, with its facet 11 as reference, is set on the stage of an exposure device. Facet 11 and beam coordinate axis OX are set in parallel. Next, positioning marks on chips 13, 14 on wafer 10 are scanned from o in the direction of x along scanning line 12 in the direction of X of the electron beam, and the intersections R1, S1 of positioning marks A1B1, A1C1 are detected. Then, the coordinates of point P1 lying on the line which is perpendicular to and divides the distance R1S1 into equal parts and is 1/2 of R1S1 are calculated. Subsequently, chip 14 is scanned, and similar point P2 is obtained. From these, the angle of rotation α between the wafer coordinate axis o'x' and the beam coordination axis ox is calculated. Positioning is operated so that the beam coordinate axes and the wafer coordinate axes become parallel to one another. By this, positioning time can be reduced remarkably.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12707978A JPS5910577B2 (en) | 1978-10-16 | 1978-10-16 | How to align semiconductor wafers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12707978A JPS5910577B2 (en) | 1978-10-16 | 1978-10-16 | How to align semiconductor wafers |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5553418A true JPS5553418A (en) | 1980-04-18 |
JPS5910577B2 JPS5910577B2 (en) | 1984-03-09 |
Family
ID=14951045
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12707978A Expired JPS5910577B2 (en) | 1978-10-16 | 1978-10-16 | How to align semiconductor wafers |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5910577B2 (en) |
-
1978
- 1978-10-16 JP JP12707978A patent/JPS5910577B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5910577B2 (en) | 1984-03-09 |
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