JPS5544509A - Vacuum apparatus part coated with metallic nitride - Google Patents
Vacuum apparatus part coated with metallic nitrideInfo
- Publication number
- JPS5544509A JPS5544509A JP11586378A JP11586378A JPS5544509A JP S5544509 A JPS5544509 A JP S5544509A JP 11586378 A JP11586378 A JP 11586378A JP 11586378 A JP11586378 A JP 11586378A JP S5544509 A JPS5544509 A JP S5544509A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- vacuum apparatus
- coating
- vessel
- nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/02—Apparatus characterised by their chemically-resistant properties
- B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
- B01J2219/0236—Metal based
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Flanged Joints, Insulating Joints, And Other Joints (AREA)
Abstract
PURPOSE: To prevent the release of impurities from a vacuum apparatus etc. and to decrease the speed of a vacuum pump required to produce a given vacuum, by coating the surface of a vacuum vessel or parts for a vacuum apparatus with nitride of a metal e.g., B, Al, Si, or Ti etc. by reactive evaporation.
CONSTITUTION: The surface of a vacuum vessel or vacuum apparatus parts made of stainless steel etc. is coated with a nitride of a metal, e.g., B, Al, Si, Ti, Zr etc, by reactive evaporation. The coating is chemically stable, the surface is very smooth, and the quantity of gas adsorbed on the surface is very small. In addn., the coating is high in hardness, corrosion resistance, and heat resistance, so that it is hardly flawed. Use of the vessel or parts made by this method makes vacuum operations or treatment easy, and decreases the speed of a vacuum pump required to produce the same high vacuum to 1/2W1/3.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53115863A JPS5832229B2 (en) | 1978-09-22 | 1978-09-22 | Vacuum containers and vacuum equipment parts coated with metal nitride |
DE19792900057 DE2900057C3 (en) | 1978-09-22 | 1979-01-02 | Vacuum container |
CH19579A CH646072A5 (en) | 1978-09-22 | 1979-01-09 | Method for reducing the amount of gas absorbed on a metallic surface |
FR7901177A FR2436625A1 (en) | 1978-09-22 | 1979-01-10 | VACUUM CONTAINER AND OTHER VACUUM EQUIPMENT PARTS |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53115863A JPS5832229B2 (en) | 1978-09-22 | 1978-09-22 | Vacuum containers and vacuum equipment parts coated with metal nitride |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5544509A true JPS5544509A (en) | 1980-03-28 |
JPS5832229B2 JPS5832229B2 (en) | 1983-07-12 |
Family
ID=14673005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53115863A Expired JPS5832229B2 (en) | 1978-09-22 | 1978-09-22 | Vacuum containers and vacuum equipment parts coated with metal nitride |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5832229B2 (en) |
CH (1) | CH646072A5 (en) |
DE (1) | DE2900057C3 (en) |
FR (1) | FR2436625A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006009038A (en) * | 2003-06-10 | 2006-01-12 | Shinku Jikkenshitsu:Kk | Material for parts in vacuum apparatus, parts in vacuum apparatus, vacuum apparatus, method for manufacturing material for parts in vacuum apparatus, method for treating parts in vacuum apparatus, and treatment method in vacuum apparatus |
JP2017503078A (en) * | 2013-12-30 | 2017-01-26 | ジーティーエイティー・コーポレーション | Improved radiation shielding for CVD reactors. |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5684789A (en) * | 1979-12-13 | 1981-07-10 | Toyo Eng Corp | High-temperature treatment of hydrocarbon-containing material |
JPS6055877U (en) * | 1983-09-26 | 1985-04-19 | 株式会社タニタ | fire starter crater |
US5478524A (en) * | 1992-08-24 | 1995-12-26 | Nissan Motor Co., Ltd. | Super high vacuum vessel |
US6451181B1 (en) | 1999-03-02 | 2002-09-17 | Motorola, Inc. | Method of forming a semiconductor device barrier layer |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4834912A (en) * | 1971-09-09 | 1973-05-23 | ||
JPS5210867A (en) * | 1975-07-15 | 1977-01-27 | Matsushita Electric Ind Co Ltd | Apparatus for forming films in vacuum |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE7120919U (en) * | 1971-08-26 | Rhone Poulenc Sa | Laboratory autoclave made of glazed steel | |
FR1405264A (en) * | 1964-05-12 | 1965-07-09 | Commissariat Energie Atomique | Manufacturing process of vacuum chambers |
US3537891A (en) * | 1967-09-25 | 1970-11-03 | Gen Electric | Resistor films of transition metal nitrides and method of forming |
US3540926A (en) * | 1968-10-09 | 1970-11-17 | Gen Electric | Nitride insulating films deposited by reactive evaporation |
US3833430A (en) * | 1972-12-26 | 1974-09-03 | Varian Associates | Treatment of stainless steel and similar alloys to reduce hydrogen outgassing |
-
1978
- 1978-09-22 JP JP53115863A patent/JPS5832229B2/en not_active Expired
-
1979
- 1979-01-02 DE DE19792900057 patent/DE2900057C3/en not_active Expired
- 1979-01-09 CH CH19579A patent/CH646072A5/en not_active IP Right Cessation
- 1979-01-10 FR FR7901177A patent/FR2436625A1/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4834912A (en) * | 1971-09-09 | 1973-05-23 | ||
JPS5210867A (en) * | 1975-07-15 | 1977-01-27 | Matsushita Electric Ind Co Ltd | Apparatus for forming films in vacuum |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006009038A (en) * | 2003-06-10 | 2006-01-12 | Shinku Jikkenshitsu:Kk | Material for parts in vacuum apparatus, parts in vacuum apparatus, vacuum apparatus, method for manufacturing material for parts in vacuum apparatus, method for treating parts in vacuum apparatus, and treatment method in vacuum apparatus |
JP2017503078A (en) * | 2013-12-30 | 2017-01-26 | ジーティーエイティー・コーポレーション | Improved radiation shielding for CVD reactors. |
JP2019060025A (en) * | 2013-12-30 | 2019-04-18 | ジーティーエイティー・コーポレーション | Improved radiation shielding for cvd reactor |
US11015244B2 (en) | 2013-12-30 | 2021-05-25 | Advanced Material Solutions, Llc | Radiation shielding for a CVD reactor |
Also Published As
Publication number | Publication date |
---|---|
JPS5832229B2 (en) | 1983-07-12 |
CH646072A5 (en) | 1984-11-15 |
DE2900057A1 (en) | 1980-03-27 |
FR2436625B1 (en) | 1983-07-29 |
DE2900057B2 (en) | 1980-11-27 |
DE2900057C3 (en) | 1981-10-08 |
FR2436625A1 (en) | 1980-04-18 |
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