JPS5534478A - Forming pattern - Google Patents
Forming patternInfo
- Publication number
- JPS5534478A JPS5534478A JP10778678A JP10778678A JPS5534478A JP S5534478 A JPS5534478 A JP S5534478A JP 10778678 A JP10778678 A JP 10778678A JP 10778678 A JP10778678 A JP 10778678A JP S5534478 A JPS5534478 A JP S5534478A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- electrical contact
- pattern
- charged beams
- insulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10778678A JPS5534478A (en) | 1978-09-01 | 1978-09-01 | Forming pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10778678A JPS5534478A (en) | 1978-09-01 | 1978-09-01 | Forming pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5534478A true JPS5534478A (en) | 1980-03-11 |
Family
ID=14467979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10778678A Pending JPS5534478A (en) | 1978-09-01 | 1978-09-01 | Forming pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5534478A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56150825A (en) * | 1980-04-24 | 1981-11-21 | Toshiba Corp | Manufacture of semiconductor device |
JPS5713741A (en) * | 1980-06-27 | 1982-01-23 | Nec Corp | Emitting method for charged particle beam in manufacture of semiconductor device |
JPS57193030A (en) * | 1981-05-25 | 1982-11-27 | Nec Corp | Emitting method for charged particle beam in manufacture of semiconductor device |
JPS6052019A (ja) * | 1983-08-31 | 1985-03-23 | Fujitsu Ltd | 半導体装置の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50112764A (ja) * | 1974-02-18 | 1975-09-04 | ||
JPS5357974A (en) * | 1976-11-05 | 1978-05-25 | Mitsubishi Electric Corp | Electron beam exposure method |
-
1978
- 1978-09-01 JP JP10778678A patent/JPS5534478A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50112764A (ja) * | 1974-02-18 | 1975-09-04 | ||
JPS5357974A (en) * | 1976-11-05 | 1978-05-25 | Mitsubishi Electric Corp | Electron beam exposure method |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56150825A (en) * | 1980-04-24 | 1981-11-21 | Toshiba Corp | Manufacture of semiconductor device |
JPS5713741A (en) * | 1980-06-27 | 1982-01-23 | Nec Corp | Emitting method for charged particle beam in manufacture of semiconductor device |
JPS57193030A (en) * | 1981-05-25 | 1982-11-27 | Nec Corp | Emitting method for charged particle beam in manufacture of semiconductor device |
JPS6052019A (ja) * | 1983-08-31 | 1985-03-23 | Fujitsu Ltd | 半導体装置の製造方法 |
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