JPS5528739A - Glass film forming method by photosensitizing treatment - Google Patents

Glass film forming method by photosensitizing treatment

Info

Publication number
JPS5528739A
JPS5528739A JP10179578A JP10179578A JPS5528739A JP S5528739 A JPS5528739 A JP S5528739A JP 10179578 A JP10179578 A JP 10179578A JP 10179578 A JP10179578 A JP 10179578A JP S5528739 A JPS5528739 A JP S5528739A
Authority
JP
Japan
Prior art keywords
substrate
glass
film forming
forming method
glass film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10179578A
Other languages
Japanese (ja)
Other versions
JPS618754B2 (en
Inventor
Kazutoshi Ashikawa
Yoshio Nonaka
Koichiro Yamada
Masamichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10179578A priority Critical patent/JPS5528739A/en
Publication of JPS5528739A publication Critical patent/JPS5528739A/en
Publication of JPS618754B2 publication Critical patent/JPS618754B2/ja
Granted legal-status Critical Current

Links

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  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE: To make selective formation of glass films sure by improving the adhesiveness between photo glass and substrate.
CONSTITUTION: After photo resist 4 is thinly coated on a substrate 1, photo resist 5 containing glass components is coated thereon and is subjected to exposure and development through a mask, whereby part of the films of the photo resist 4 and the photo resist 5 containing glass are selectively removed. Thereafter, the substrate is subjected to firing, whereby the remaining photo resists are flown off and the glass components are sintered on the substrate 1.
COPYRIGHT: (C)1980,JPO&Japio
JP10179578A 1978-08-23 1978-08-23 Glass film forming method by photosensitizing treatment Granted JPS5528739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10179578A JPS5528739A (en) 1978-08-23 1978-08-23 Glass film forming method by photosensitizing treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10179578A JPS5528739A (en) 1978-08-23 1978-08-23 Glass film forming method by photosensitizing treatment

Publications (2)

Publication Number Publication Date
JPS5528739A true JPS5528739A (en) 1980-02-29
JPS618754B2 JPS618754B2 (en) 1986-03-17

Family

ID=14310084

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10179578A Granted JPS5528739A (en) 1978-08-23 1978-08-23 Glass film forming method by photosensitizing treatment

Country Status (1)

Country Link
JP (1) JPS5528739A (en)

Also Published As

Publication number Publication date
JPS618754B2 (en) 1986-03-17

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