JPS5518674A - Ionized radiation sensitive negative type resist - Google Patents
Ionized radiation sensitive negative type resistInfo
- Publication number
- JPS5518674A JPS5518674A JP9237678A JP9237678A JPS5518674A JP S5518674 A JPS5518674 A JP S5518674A JP 9237678 A JP9237678 A JP 9237678A JP 9237678 A JP9237678 A JP 9237678A JP S5518674 A JPS5518674 A JP S5518674A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- radiation sensitive
- negative type
- molecular weight
- ionized radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE:To form an ionized radiation sensitive negative type resist having high sensitivity, high dry etching resistance, and high resolution, and low molecular weight, by using a polymer consisting mainly of a specified acrylamide derivative monomer. CONSTITUTION:A solution of a polymer consisting mainly of N-2,3-epithiopropyl- N-methylmethacrylamide or the like represented by the formula shown in which R is H or alkyl and R' is S or O, is coated and dried on a substrate of chromium mask or the like to form a resist film. The resist film is irradiated by electron beams or the like to make a latent pattern. This is developed and undergoes dry or wet etching to form an etching pattern. Amide bonds in the resist molecule improve adhesivity to the substrate and can prevent swelling during the development step. Introduction of S in R' in the formula increases cross-linking, so the molecular weight of the polymer may be less than 50,000, thus enabling enhancement of sensitivity, resolution, and dry etching resistance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9237678A JPS5518674A (en) | 1978-07-28 | 1978-07-28 | Ionized radiation sensitive negative type resist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9237678A JPS5518674A (en) | 1978-07-28 | 1978-07-28 | Ionized radiation sensitive negative type resist |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5518674A true JPS5518674A (en) | 1980-02-08 |
Family
ID=14052699
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9237678A Pending JPS5518674A (en) | 1978-07-28 | 1978-07-28 | Ionized radiation sensitive negative type resist |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5518674A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5788056A (en) * | 1980-11-17 | 1982-06-01 | Nippon Oils & Fats Co Ltd | Air entraining agent composition |
-
1978
- 1978-07-28 JP JP9237678A patent/JPS5518674A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5788056A (en) * | 1980-11-17 | 1982-06-01 | Nippon Oils & Fats Co Ltd | Air entraining agent composition |
| JPS6320797B2 (en) * | 1980-11-17 | 1988-04-30 | Nippon Oils & Fats Co Ltd |
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