JPS55165627A - Method for diffusing impurity into semiconductor - Google Patents
Method for diffusing impurity into semiconductorInfo
- Publication number
- JPS55165627A JPS55165627A JP7265479A JP7265479A JPS55165627A JP S55165627 A JPS55165627 A JP S55165627A JP 7265479 A JP7265479 A JP 7265479A JP 7265479 A JP7265479 A JP 7265479A JP S55165627 A JPS55165627 A JP S55165627A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- sio2
- deposited
- diffused
- impurities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012535 impurity Substances 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 8
- 239000000758 substrate Substances 0.000 abstract 6
- 229910052681 coesite Inorganic materials 0.000 abstract 4
- 229910052906 cristobalite Inorganic materials 0.000 abstract 4
- 239000000377 silicon dioxide Substances 0.000 abstract 4
- 235000012239 silicon dioxide Nutrition 0.000 abstract 4
- 229910052682 stishovite Inorganic materials 0.000 abstract 4
- 229910052905 tridymite Inorganic materials 0.000 abstract 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2252—Diffusion into or out of group IV semiconductors using predeposition of impurities into the semiconductor surface, e.g. from a gaseous phase
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7265479A JPS55165627A (en) | 1979-06-09 | 1979-06-09 | Method for diffusing impurity into semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7265479A JPS55165627A (en) | 1979-06-09 | 1979-06-09 | Method for diffusing impurity into semiconductor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55165627A true JPS55165627A (en) | 1980-12-24 |
JPS6152565B2 JPS6152565B2 (enrdf_load_stackoverflow) | 1986-11-13 |
Family
ID=13495576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7265479A Granted JPS55165627A (en) | 1979-06-09 | 1979-06-09 | Method for diffusing impurity into semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55165627A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013168564A (ja) * | 2012-02-16 | 2013-08-29 | Ngk Insulators Ltd | 半導体装置及びその製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4840805A (enrdf_load_stackoverflow) * | 1971-09-23 | 1973-06-15 | ||
JPS4844271A (enrdf_load_stackoverflow) * | 1971-10-07 | 1973-06-26 | ||
JPS4973077A (enrdf_load_stackoverflow) * | 1972-11-14 | 1974-07-15 |
-
1979
- 1979-06-09 JP JP7265479A patent/JPS55165627A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4840805A (enrdf_load_stackoverflow) * | 1971-09-23 | 1973-06-15 | ||
JPS4844271A (enrdf_load_stackoverflow) * | 1971-10-07 | 1973-06-26 | ||
JPS4973077A (enrdf_load_stackoverflow) * | 1972-11-14 | 1974-07-15 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013168564A (ja) * | 2012-02-16 | 2013-08-29 | Ngk Insulators Ltd | 半導体装置及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6152565B2 (enrdf_load_stackoverflow) | 1986-11-13 |
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