JPS55161244A - Lithographic plate not requiring wetting water - Google Patents
Lithographic plate not requiring wetting waterInfo
- Publication number
- JPS55161244A JPS55161244A JP6743779A JP6743779A JPS55161244A JP S55161244 A JPS55161244 A JP S55161244A JP 6743779 A JP6743779 A JP 6743779A JP 6743779 A JP6743779 A JP 6743779A JP S55161244 A JPS55161244 A JP S55161244A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- interlayer
- photosensitive layer
- epoxy resin
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title 1
- 238000009736 wetting Methods 0.000 title 1
- 239000010410 layer Substances 0.000 abstract 7
- 239000011229 interlayer Substances 0.000 abstract 4
- 239000003822 epoxy resin Substances 0.000 abstract 3
- 229920000647 polyepoxide Polymers 0.000 abstract 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920002379 silicone rubber Polymers 0.000 abstract 2
- 239000004945 silicone rubber Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 abstract 1
- 229920000877 Melamine resin Polymers 0.000 abstract 1
- 239000004640 Melamine resin Substances 0.000 abstract 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 229920001807 Urea-formaldehyde Polymers 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- -1 e.g. Chemical compound 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 239000005011 phenolic resin Substances 0.000 abstract 1
- 229920001187 thermosetting polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6743779A JPS55161244A (en) | 1979-06-01 | 1979-06-01 | Lithographic plate not requiring wetting water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6743779A JPS55161244A (en) | 1979-06-01 | 1979-06-01 | Lithographic plate not requiring wetting water |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55161244A true JPS55161244A (en) | 1980-12-15 |
JPS6154219B2 JPS6154219B2 (enrdf_load_stackoverflow) | 1986-11-21 |
Family
ID=13344893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6743779A Granted JPS55161244A (en) | 1979-06-01 | 1979-06-01 | Lithographic plate not requiring wetting water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55161244A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59202467A (ja) * | 1983-05-02 | 1984-11-16 | Toray Ind Inc | ネガ型湿し水不要平版印刷版の刷版 |
JPS609799A (ja) * | 1983-06-29 | 1985-01-18 | Toray Ind Inc | 湿し水不要平版印刷版 |
JPH027049A (ja) * | 1988-06-27 | 1990-01-11 | Konica Corp | 湿し水不要平版印刷版材料 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4894504A (enrdf_load_stackoverflow) * | 1972-03-21 | 1973-12-05 | ||
JPS5025302A (enrdf_load_stackoverflow) * | 1973-07-06 | 1975-03-18 |
-
1979
- 1979-06-01 JP JP6743779A patent/JPS55161244A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4894504A (enrdf_load_stackoverflow) * | 1972-03-21 | 1973-12-05 | ||
JPS5025302A (enrdf_load_stackoverflow) * | 1973-07-06 | 1975-03-18 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59202467A (ja) * | 1983-05-02 | 1984-11-16 | Toray Ind Inc | ネガ型湿し水不要平版印刷版の刷版 |
JPS609799A (ja) * | 1983-06-29 | 1985-01-18 | Toray Ind Inc | 湿し水不要平版印刷版 |
JPH027049A (ja) * | 1988-06-27 | 1990-01-11 | Konica Corp | 湿し水不要平版印刷版材料 |
Also Published As
Publication number | Publication date |
---|---|
JPS6154219B2 (enrdf_load_stackoverflow) | 1986-11-21 |
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