JPS55159441A - Lithographic plate material not requiring wetting water - Google Patents

Lithographic plate material not requiring wetting water

Info

Publication number
JPS55159441A
JPS55159441A JP6783979A JP6783979A JPS55159441A JP S55159441 A JPS55159441 A JP S55159441A JP 6783979 A JP6783979 A JP 6783979A JP 6783979 A JP6783979 A JP 6783979A JP S55159441 A JPS55159441 A JP S55159441A
Authority
JP
Japan
Prior art keywords
plate material
polymer
printing
wetting water
lithographic plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6783979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6320340B2 (enrdf_load_stackoverflow
Inventor
Takao Kinashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP6783979A priority Critical patent/JPS55159441A/ja
Publication of JPS55159441A publication Critical patent/JPS55159441A/ja
Publication of JPS6320340B2 publication Critical patent/JPS6320340B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP6783979A 1979-05-31 1979-05-31 Lithographic plate material not requiring wetting water Granted JPS55159441A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6783979A JPS55159441A (en) 1979-05-31 1979-05-31 Lithographic plate material not requiring wetting water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6783979A JPS55159441A (en) 1979-05-31 1979-05-31 Lithographic plate material not requiring wetting water

Publications (2)

Publication Number Publication Date
JPS55159441A true JPS55159441A (en) 1980-12-11
JPS6320340B2 JPS6320340B2 (enrdf_load_stackoverflow) 1988-04-27

Family

ID=13356512

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6783979A Granted JPS55159441A (en) 1979-05-31 1979-05-31 Lithographic plate material not requiring wetting water

Country Status (1)

Country Link
JP (1) JPS55159441A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006209112A (ja) * 2005-01-27 2006-08-10 Dongjin Semichem Co Ltd 感光性樹脂組成物、ｌｃｄ基板及びそのパターン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006209112A (ja) * 2005-01-27 2006-08-10 Dongjin Semichem Co Ltd 感光性樹脂組成物、ｌｃｄ基板及びそのパターン形成方法

Also Published As

Publication number Publication date
JPS6320340B2 (enrdf_load_stackoverflow) 1988-04-27

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