JPS5515205A - Electronic beam exposure apparatus - Google Patents

Electronic beam exposure apparatus

Info

Publication number
JPS5515205A
JPS5515205A JP8715778A JP8715778A JPS5515205A JP S5515205 A JPS5515205 A JP S5515205A JP 8715778 A JP8715778 A JP 8715778A JP 8715778 A JP8715778 A JP 8715778A JP S5515205 A JPS5515205 A JP S5515205A
Authority
JP
Japan
Prior art keywords
electronic beam
air
electronic
ion
collision
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8715778A
Other languages
English (en)
Japanese (ja)
Other versions
JPS633452B2 (enrdf_load_stackoverflow
Inventor
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8715778A priority Critical patent/JPS5515205A/ja
Publication of JPS5515205A publication Critical patent/JPS5515205A/ja
Publication of JPS633452B2 publication Critical patent/JPS633452B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP8715778A 1978-07-19 1978-07-19 Electronic beam exposure apparatus Granted JPS5515205A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8715778A JPS5515205A (en) 1978-07-19 1978-07-19 Electronic beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8715778A JPS5515205A (en) 1978-07-19 1978-07-19 Electronic beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS5515205A true JPS5515205A (en) 1980-02-02
JPS633452B2 JPS633452B2 (enrdf_load_stackoverflow) 1988-01-23

Family

ID=13907145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8715778A Granted JPS5515205A (en) 1978-07-19 1978-07-19 Electronic beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS5515205A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103135A (ja) * 1981-12-15 1983-06-20 Fujitsu Ltd 電子ビ−ム露光方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52147074A (en) * 1976-06-02 1977-12-07 Hitachi Ltd Ion implantation apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52147074A (en) * 1976-06-02 1977-12-07 Hitachi Ltd Ion implantation apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103135A (ja) * 1981-12-15 1983-06-20 Fujitsu Ltd 電子ビ−ム露光方法

Also Published As

Publication number Publication date
JPS633452B2 (enrdf_load_stackoverflow) 1988-01-23

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