JPS55143072A - Manufacturing method of high dielectric strength insulation gate field-effect transistor - Google Patents

Manufacturing method of high dielectric strength insulation gate field-effect transistor

Info

Publication number
JPS55143072A
JPS55143072A JP5190779A JP5190779A JPS55143072A JP S55143072 A JPS55143072 A JP S55143072A JP 5190779 A JP5190779 A JP 5190779A JP 5190779 A JP5190779 A JP 5190779A JP S55143072 A JPS55143072 A JP S55143072A
Authority
JP
Japan
Prior art keywords
layer
ion
opening
oxidized
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5190779A
Other languages
English (en)
Inventor
Yoshihiro Miyamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5190779A priority Critical patent/JPS55143072A/ja
Publication of JPS55143072A publication Critical patent/JPS55143072A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
JP5190779A 1979-04-25 1979-04-25 Manufacturing method of high dielectric strength insulation gate field-effect transistor Pending JPS55143072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5190779A JPS55143072A (en) 1979-04-25 1979-04-25 Manufacturing method of high dielectric strength insulation gate field-effect transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5190779A JPS55143072A (en) 1979-04-25 1979-04-25 Manufacturing method of high dielectric strength insulation gate field-effect transistor

Publications (1)

Publication Number Publication Date
JPS55143072A true JPS55143072A (en) 1980-11-08

Family

ID=12899939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5190779A Pending JPS55143072A (en) 1979-04-25 1979-04-25 Manufacturing method of high dielectric strength insulation gate field-effect transistor

Country Status (1)

Country Link
JP (1) JPS55143072A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02237159A (ja) * 1989-03-10 1990-09-19 Toshiba Corp 半導体装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02237159A (ja) * 1989-03-10 1990-09-19 Toshiba Corp 半導体装置

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