JPS5737882A - Compound semiconductor device and production thereof - Google Patents
Compound semiconductor device and production thereofInfo
- Publication number
- JPS5737882A JPS5737882A JP11343680A JP11343680A JPS5737882A JP S5737882 A JPS5737882 A JP S5737882A JP 11343680 A JP11343680 A JP 11343680A JP 11343680 A JP11343680 A JP 11343680A JP S5737882 A JPS5737882 A JP S5737882A
- Authority
- JP
- Japan
- Prior art keywords
- resist mask
- region
- ion
- junction
- breakdown
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0605—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits made of compound material, e.g. AIIIBV
Abstract
PURPOSE:To prevent breakdown of an FET by making the n layer of a pnp junction equal in the carrier concentration to the source layer of MESFET near which a pnp junction region is provided. CONSTITUTION:Si ion is selectively implanted into a channel region 4 employing a resist mask on a half-insulating substrate 1 doped with Cr. Subsequently, with a resist mask applied again, Si ion is implanted into a source 2, a drain 3 and the region 5 at a high concentration. Then, with a resist mask, Mg ion implanted to make p layers 61 and 62. The resist mask is removed and after an annealing in an As atmosphere, ohmic electrodes 7, 9, 101 and 102 and a gate electrode 8 on the channel are attached. When a connection is made as specified, the junction region 656 yields before the breakdown of the Schottkey junction thereby preventing the breakdown of the FET. This enables simultaneous formation an N layer 5 of the junction region 656 with the source thereby simplifying the production process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11343680A JPS5737882A (en) | 1980-08-20 | 1980-08-20 | Compound semiconductor device and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11343680A JPS5737882A (en) | 1980-08-20 | 1980-08-20 | Compound semiconductor device and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5737882A true JPS5737882A (en) | 1982-03-02 |
Family
ID=14612167
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11343680A Pending JPS5737882A (en) | 1980-08-20 | 1980-08-20 | Compound semiconductor device and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5737882A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61114755A (en) * | 1984-11-09 | 1986-06-02 | 株式会社御池鐵工所 | Compression and heating type grinder |
US5143857A (en) * | 1988-11-07 | 1992-09-01 | Triquint Semiconductor, Inc. | Method of fabricating an electronic device with reduced susceptiblity to backgating effects |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5348487A (en) * | 1976-10-14 | 1978-05-01 | Fujitsu Ltd | Semiconductor device |
-
1980
- 1980-08-20 JP JP11343680A patent/JPS5737882A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5348487A (en) * | 1976-10-14 | 1978-05-01 | Fujitsu Ltd | Semiconductor device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61114755A (en) * | 1984-11-09 | 1986-06-02 | 株式会社御池鐵工所 | Compression and heating type grinder |
JPH0148821B2 (en) * | 1984-11-09 | 1989-10-20 | Miike Tetsukosho Kk | |
US5143857A (en) * | 1988-11-07 | 1992-09-01 | Triquint Semiconductor, Inc. | Method of fabricating an electronic device with reduced susceptiblity to backgating effects |
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