JPS55127552A - Photosensitive laminate - Google Patents
Photosensitive laminateInfo
- Publication number
- JPS55127552A JPS55127552A JP3521079A JP3521079A JPS55127552A JP S55127552 A JPS55127552 A JP S55127552A JP 3521079 A JP3521079 A JP 3521079A JP 3521079 A JP3521079 A JP 3521079A JP S55127552 A JPS55127552 A JP S55127552A
- Authority
- JP
- Japan
- Prior art keywords
- mixture
- soluble
- layer
- polyamide
- alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 abstract 3
- 239000004952 Polyamide Substances 0.000 abstract 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 239000000203 mixture Substances 0.000 abstract 3
- 229920002647 polyamide Polymers 0.000 abstract 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 229920003986 novolac Polymers 0.000 abstract 2
- 239000005011 phenolic resin Substances 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000000243 solution Substances 0.000 abstract 2
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 abstract 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 abstract 1
- 230000001476 alcoholic effect Effects 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 235000019445 benzyl alcohol Nutrition 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000011259 mixed solution Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 229920006267 polyester film Polymers 0.000 abstract 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3521079A JPS55127552A (en) | 1979-03-26 | 1979-03-26 | Photosensitive laminate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3521079A JPS55127552A (en) | 1979-03-26 | 1979-03-26 | Photosensitive laminate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55127552A true JPS55127552A (en) | 1980-10-02 |
| JPS6316727B2 JPS6316727B2 (enrdf_load_stackoverflow) | 1988-04-11 |
Family
ID=12435474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3521079A Granted JPS55127552A (en) | 1979-03-26 | 1979-03-26 | Photosensitive laminate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55127552A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57105735A (en) * | 1980-12-23 | 1982-07-01 | Daicel Chem Ind Ltd | Photosensitive image-forming material |
| JPS638735A (ja) * | 1986-06-30 | 1988-01-14 | Tokyo Ohka Kogyo Co Ltd | パタ−ン形成用感光性樹脂板 |
| JPH02132443A (ja) * | 1987-11-02 | 1990-05-21 | Matsushita Electric Ind Co Ltd | パターン形成材料 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0225115A (ja) * | 1988-07-14 | 1990-01-26 | Fuji Electric Co Ltd | アナログ−ディジタル変換装置 |
-
1979
- 1979-03-26 JP JP3521079A patent/JPS55127552A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57105735A (en) * | 1980-12-23 | 1982-07-01 | Daicel Chem Ind Ltd | Photosensitive image-forming material |
| JPS638735A (ja) * | 1986-06-30 | 1988-01-14 | Tokyo Ohka Kogyo Co Ltd | パタ−ン形成用感光性樹脂板 |
| JPH02132443A (ja) * | 1987-11-02 | 1990-05-21 | Matsushita Electric Ind Co Ltd | パターン形成材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6316727B2 (enrdf_load_stackoverflow) | 1988-04-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS566236A (en) | Photosensitive material and pattern forming method using it | |
| ATE2100T1 (de) | Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial. | |
| JPS5730829A (en) | Micropattern formation method | |
| JPH0326827B2 (enrdf_load_stackoverflow) | ||
| KR900702421A (ko) | 주형 용매로서 에틸 락테이트와 에틸 3-에톡시 프로피오네이트의 선택된 혼합물을 사용하는 포지티브 작용성 감광성 내식막 | |
| JPS5569265A (en) | Pattern-forming method | |
| JPS56162744A (en) | Formation of fine pattern | |
| KR940005992A (ko) | 기판 상에 패턴화된 폴리이미드 피막을 형성하는 방법 | |
| JPH0150892B2 (enrdf_load_stackoverflow) | ||
| JPS55127552A (en) | Photosensitive laminate | |
| JPS5660442A (en) | Photosensitive lithographic plate and method for making lithographic plate | |
| JPS57208556A (en) | Photosensitive printing plate material | |
| GB2049210A (en) | Photographic formation of visible images | |
| US3650754A (en) | Photoresist compositions containing limed rosin and photoactinator | |
| JPS5595324A (en) | Manufacturing method of semiconductor device | |
| JPS5738141A (en) | Manufacture of printing plate | |
| GB637857A (en) | Improvements in or relating to photographic processes | |
| JPS5724945A (en) | Lithographic printing plate and its preparation | |
| EP0318956A3 (en) | Positive-working photoresist compositions and use thereof for forming positive-tone relief images | |
| EP0162691A3 (en) | Water-developable, negative-working, lithographic printing plate | |
| JPS55137527A (en) | Image forming material processing method | |
| KR890004418A (ko) | 휴대용 빌트-온(built-on) 마스크를 갖는 포토레지스트 제품 | |
| JPS55155349A (en) | Photosensitive image forming material | |
| JPS5421271A (en) | Pattern forming method | |
| JPS57141639A (en) | Photosensitive resin composition |