JPS55127056A - Semiconductor integrated circuit device - Google Patents

Semiconductor integrated circuit device

Info

Publication number
JPS55127056A
JPS55127056A JP3443879A JP3443879A JPS55127056A JP S55127056 A JPS55127056 A JP S55127056A JP 3443879 A JP3443879 A JP 3443879A JP 3443879 A JP3443879 A JP 3443879A JP S55127056 A JPS55127056 A JP S55127056A
Authority
JP
Japan
Prior art keywords
layer
sbd
film
integrated circuit
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3443879A
Other languages
Japanese (ja)
Inventor
Minoru Enomoto
Yasushi Hatta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3443879A priority Critical patent/JPS55127056A/en
Publication of JPS55127056A publication Critical patent/JPS55127056A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/0814Diodes only

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)

Abstract

PURPOSE:To improve integration and function of a integrated circuit using a multitude of Schottky barrier diodes (SBD) by forming a plural piece of p-type SBD on a substrate the surface layer of which is p-type. CONSTITUTION:An n<-> epitaxial layer 11 is provided on a p<-> Si substrate 9 through an n<+> buried layer 10 and isolated by a p<+> layer 12, and an n<+> extracted layer 13 is connected to the buried layer. An opening is provided in an oxidized film 14 on the surface and after plating with a Pt film 15, an eutectic alloy 16 is made through sintering. The Pt on the film 14 is removed, W 17 and Ti 18 are laminated, Al is further placed thereon and from forming an electrode 19 through photoetching, there is formed an n<+>-type SBD. According to this constitution, an isolation at every SBD is not required, a p<+> extraction on anode side can be performed in common by the layer 13, an occupied area is decreased to 30 through 50%, thus improving integration. Then, a formation of extra pn-junction for isolation is not necessary, and a parasitic capacity is decreased to improve operational speed.
JP3443879A 1979-03-26 1979-03-26 Semiconductor integrated circuit device Pending JPS55127056A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3443879A JPS55127056A (en) 1979-03-26 1979-03-26 Semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3443879A JPS55127056A (en) 1979-03-26 1979-03-26 Semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
JPS55127056A true JPS55127056A (en) 1980-10-01

Family

ID=12414221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3443879A Pending JPS55127056A (en) 1979-03-26 1979-03-26 Semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPS55127056A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61214466A (en) * 1985-03-19 1986-09-24 Sanyo Electric Co Ltd Semiconductor device
EP0899794A2 (en) * 1997-08-27 1999-03-03 Siemens Aktiengesellschaft High frequency diode and method for fabricating it

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61214466A (en) * 1985-03-19 1986-09-24 Sanyo Electric Co Ltd Semiconductor device
EP0899794A2 (en) * 1997-08-27 1999-03-03 Siemens Aktiengesellschaft High frequency diode and method for fabricating it
EP0899794A3 (en) * 1997-08-27 1999-11-03 Siemens Aktiengesellschaft High frequency diode and method for fabricating it

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