JPS55127020A - X-ray exposure device - Google Patents
X-ray exposure deviceInfo
- Publication number
- JPS55127020A JPS55127020A JP3429179A JP3429179A JPS55127020A JP S55127020 A JPS55127020 A JP S55127020A JP 3429179 A JP3429179 A JP 3429179A JP 3429179 A JP3429179 A JP 3429179A JP S55127020 A JPS55127020 A JP S55127020A
- Authority
- JP
- Japan
- Prior art keywords
- ray beam
- crystal
- ray
- slit
- distortion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Radiography Using Non-Light Waves (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To eliminate a partial shadow or the distortion of an image by converting an X-ray beam into a parallel beam wherein a crystal fixed by the wave length of X- rays and grid composition is arranged in an X-ray beam applied from a target.
CONSTITUTION: A crystal 9 fixed by the wave length of a used X-ray and grid composition is arranged in the X-ray beam applied from a target 2. The X-ray beam is converted into a parallel beam by a specific diffraction surface 10 in the crystal. The X-ray beam converted into the parallel beam passes through a slit 12 and reaches a photosensitive plastic film 4 on a substrate 3 through a mask 5. In this case, the X-ray beam passed the crystal 9 has an oval section and almost becomes a rectangular section after passing the slit 12. In this way, a partial shadow and the distortion of an image will be eliminated and it is also absolutely unnecessary any electronic lens system required for narrowly diaphragming an electronic beam.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3429179A JPS55127020A (en) | 1979-03-26 | 1979-03-26 | X-ray exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3429179A JPS55127020A (en) | 1979-03-26 | 1979-03-26 | X-ray exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55127020A true JPS55127020A (en) | 1980-10-01 |
Family
ID=12410044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3429179A Pending JPS55127020A (en) | 1979-03-26 | 1979-03-26 | X-ray exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55127020A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60178627A (en) * | 1984-02-24 | 1985-09-12 | Canon Inc | X-ray transfer device |
JPH0758010A (en) * | 1994-07-11 | 1995-03-03 | Canon Inc | Aligner |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5319905A (en) * | 1976-08-07 | 1978-02-23 | Kubota Ltd | Automatic inoculating method |
-
1979
- 1979-03-26 JP JP3429179A patent/JPS55127020A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5319905A (en) * | 1976-08-07 | 1978-02-23 | Kubota Ltd | Automatic inoculating method |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60178627A (en) * | 1984-02-24 | 1985-09-12 | Canon Inc | X-ray transfer device |
JPH0570927B2 (en) * | 1984-02-24 | 1993-10-06 | Canon Kk | |
JPH0758010A (en) * | 1994-07-11 | 1995-03-03 | Canon Inc | Aligner |
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