JPS55127020A - X-ray exposure device - Google Patents

X-ray exposure device

Info

Publication number
JPS55127020A
JPS55127020A JP3429179A JP3429179A JPS55127020A JP S55127020 A JPS55127020 A JP S55127020A JP 3429179 A JP3429179 A JP 3429179A JP 3429179 A JP3429179 A JP 3429179A JP S55127020 A JPS55127020 A JP S55127020A
Authority
JP
Japan
Prior art keywords
ray beam
crystal
ray
slit
distortion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3429179A
Other languages
Japanese (ja)
Inventor
Yoshiharu Ozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP3429179A priority Critical patent/JPS55127020A/en
Publication of JPS55127020A publication Critical patent/JPS55127020A/en
Pending legal-status Critical Current

Links

Landscapes

  • Radiography Using Non-Light Waves (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To eliminate a partial shadow or the distortion of an image by converting an X-ray beam into a parallel beam wherein a crystal fixed by the wave length of X- rays and grid composition is arranged in an X-ray beam applied from a target.
CONSTITUTION: A crystal 9 fixed by the wave length of a used X-ray and grid composition is arranged in the X-ray beam applied from a target 2. The X-ray beam is converted into a parallel beam by a specific diffraction surface 10 in the crystal. The X-ray beam converted into the parallel beam passes through a slit 12 and reaches a photosensitive plastic film 4 on a substrate 3 through a mask 5. In this case, the X-ray beam passed the crystal 9 has an oval section and almost becomes a rectangular section after passing the slit 12. In this way, a partial shadow and the distortion of an image will be eliminated and it is also absolutely unnecessary any electronic lens system required for narrowly diaphragming an electronic beam.
COPYRIGHT: (C)1980,JPO&Japio
JP3429179A 1979-03-26 1979-03-26 X-ray exposure device Pending JPS55127020A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3429179A JPS55127020A (en) 1979-03-26 1979-03-26 X-ray exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3429179A JPS55127020A (en) 1979-03-26 1979-03-26 X-ray exposure device

Publications (1)

Publication Number Publication Date
JPS55127020A true JPS55127020A (en) 1980-10-01

Family

ID=12410044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3429179A Pending JPS55127020A (en) 1979-03-26 1979-03-26 X-ray exposure device

Country Status (1)

Country Link
JP (1) JPS55127020A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60178627A (en) * 1984-02-24 1985-09-12 Canon Inc X-ray transfer device
JPH0758010A (en) * 1994-07-11 1995-03-03 Canon Inc Aligner

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5319905A (en) * 1976-08-07 1978-02-23 Kubota Ltd Automatic inoculating method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5319905A (en) * 1976-08-07 1978-02-23 Kubota Ltd Automatic inoculating method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60178627A (en) * 1984-02-24 1985-09-12 Canon Inc X-ray transfer device
JPH0570927B2 (en) * 1984-02-24 1993-10-06 Canon Kk
JPH0758010A (en) * 1994-07-11 1995-03-03 Canon Inc Aligner

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