GB1522568A - Process and apparatus for manufacture of very small integrated circuits using x-rays - Google Patents

Process and apparatus for manufacture of very small integrated circuits using x-rays

Info

Publication number
GB1522568A
GB1522568A GB2737977A GB2737977A GB1522568A GB 1522568 A GB1522568 A GB 1522568A GB 2737977 A GB2737977 A GB 2737977A GB 2737977 A GB2737977 A GB 2737977A GB 1522568 A GB1522568 A GB 1522568A
Authority
GB
United Kingdom
Prior art keywords
ray
manufacture
rays
integrated circuits
small integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2737977A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xonics Inc
Original Assignee
Xonics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xonics Inc filed Critical Xonics Inc
Publication of GB1522568A publication Critical patent/GB1522568A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0278—Röntgenlithographic or X-ray lithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

1522568 X-ray photography; integrated circuit manufacture XONICS Inc 30 June 1977 [29 Sept 1976] 27379/77 Heading G2X An x-ray sensitive substrate 13 for the production of an integrated circuit is exposed to radiation from an x-ray source 10; the radiation passes through an x-ray mask 11 and an x-ray imaging system 12 comprising inner 16 and outer 17 grazing incidence reflective surfaces which produce a reduced image of the mask at the substrate.
GB2737977A 1976-09-29 1977-06-30 Process and apparatus for manufacture of very small integrated circuits using x-rays Expired GB1522568A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72794976A 1976-09-29 1976-09-29

Publications (1)

Publication Number Publication Date
GB1522568A true GB1522568A (en) 1978-08-23

Family

ID=24924778

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2737977A Expired GB1522568A (en) 1976-09-29 1977-06-30 Process and apparatus for manufacture of very small integrated circuits using x-rays

Country Status (7)

Country Link
JP (1) JPS5342679A (en)
BE (1) BE857362A (en)
DE (1) DE2740366A1 (en)
FR (1) FR2366694A1 (en)
GB (1) GB1522568A (en)
IT (1) IT1089816B (en)
NL (1) NL7707485A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1224839A (en) * 1983-06-06 1987-07-28 Barukh Yaakobi X-ray lithography
JPS629632A (en) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol Projecting and exposing device
JPS62208631A (en) * 1986-03-07 1987-09-12 Sanyo Electric Co Ltd Reduction type x-ray lithography equipment
JP2628165B2 (en) * 1987-06-15 1997-07-09 キヤノン株式会社 X-ray exposure equipment
JP2603225B2 (en) * 1986-07-11 1997-04-23 キヤノン株式会社 X-ray projection exposure apparatus and semiconductor manufacturing method
JPH07147230A (en) * 1994-08-04 1995-06-06 Canon Inc Reduction projection aligner and manufacture of semiconductor

Also Published As

Publication number Publication date
JPS5342679A (en) 1978-04-18
NL7707485A (en) 1978-03-31
DE2740366A1 (en) 1978-03-30
FR2366694A1 (en) 1978-04-28
BE857362A (en) 1977-12-01
IT1089816B (en) 1985-06-18

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee