NL7707485A - DESIGN AND METHOD FOR MANUFACTURE OF VERY SMALL INTEGRATED CHAINS. - Google Patents
DESIGN AND METHOD FOR MANUFACTURE OF VERY SMALL INTEGRATED CHAINS.Info
- Publication number
- NL7707485A NL7707485A NL7707485A NL7707485A NL7707485A NL 7707485 A NL7707485 A NL 7707485A NL 7707485 A NL7707485 A NL 7707485A NL 7707485 A NL7707485 A NL 7707485A NL 7707485 A NL7707485 A NL 7707485A
- Authority
- NL
- Netherlands
- Prior art keywords
- manufacture
- design
- small integrated
- chains
- integrated chains
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0278—Röntgenlithographic or X-ray lithographic processes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US72794976A | 1976-09-29 | 1976-09-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7707485A true NL7707485A (en) | 1978-03-31 |
Family
ID=24924778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7707485A NL7707485A (en) | 1976-09-29 | 1977-07-06 | DESIGN AND METHOD FOR MANUFACTURE OF VERY SMALL INTEGRATED CHAINS. |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5342679A (en) |
| BE (1) | BE857362A (en) |
| DE (1) | DE2740366A1 (en) |
| FR (1) | FR2366694A1 (en) |
| GB (1) | GB1522568A (en) |
| IT (1) | IT1089816B (en) |
| NL (1) | NL7707485A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1224839A (en) * | 1983-06-06 | 1987-07-28 | Barukh Yaakobi | X-ray lithography |
| JPS629632A (en) * | 1985-07-06 | 1987-01-17 | Agency Of Ind Science & Technol | Projecting and exposing device |
| JPS62208631A (en) * | 1986-03-07 | 1987-09-12 | Sanyo Electric Co Ltd | Reduction type x-ray lithography equipment |
| JP2628165B2 (en) * | 1987-06-15 | 1997-07-09 | キヤノン株式会社 | X-ray exposure equipment |
| JP2603225B2 (en) * | 1986-07-11 | 1997-04-23 | キヤノン株式会社 | X-ray projection exposure apparatus and semiconductor manufacturing method |
| JPH07147230A (en) * | 1994-08-04 | 1995-06-06 | Canon Inc | Reduction projection aligner and manufacture of semiconductor |
-
1977
- 1977-06-30 GB GB2737977A patent/GB1522568A/en not_active Expired
- 1977-07-06 NL NL7707485A patent/NL7707485A/en not_active Application Discontinuation
- 1977-08-01 BE BE179810A patent/BE857362A/en unknown
- 1977-08-05 FR FR7724267A patent/FR2366694A1/en not_active Withdrawn
- 1977-09-08 DE DE19772740366 patent/DE2740366A1/en active Pending
- 1977-09-15 IT IT5102277A patent/IT1089816B/en active
- 1977-09-29 JP JP11618777A patent/JPS5342679A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| IT1089816B (en) | 1985-06-18 |
| BE857362A (en) | 1977-12-01 |
| DE2740366A1 (en) | 1978-03-30 |
| FR2366694A1 (en) | 1978-04-28 |
| GB1522568A (en) | 1978-08-23 |
| JPS5342679A (en) | 1978-04-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BV | The patent application has lapsed |