JPS55123130A - Plasma treating device - Google Patents

Plasma treating device

Info

Publication number
JPS55123130A
JPS55123130A JP3135179A JP3135179A JPS55123130A JP S55123130 A JPS55123130 A JP S55123130A JP 3135179 A JP3135179 A JP 3135179A JP 3135179 A JP3135179 A JP 3135179A JP S55123130 A JPS55123130 A JP S55123130A
Authority
JP
Japan
Prior art keywords
electrode plate
quartz
wafer
plate
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3135179A
Other languages
Japanese (ja)
Inventor
Daijiro Kudo
Kiyoshi Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3135179A priority Critical patent/JPS55123130A/en
Publication of JPS55123130A publication Critical patent/JPS55123130A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To prevent an electrode plate from being deformed by using electrode plate consisting of a quartz plate coated with a conductor film. CONSTITUTION:An electrode plate 1 for plasma generation is obtainable through arranging support members 3 of quartz provided with a clawed projection for wafer mounting at nearly same positions on both faces of a quartz plate 1a 1mm or more in thickness and coating surfaces of the quartz plate 1a and the support members 3 with an Al film 1b. Then, a support member 4 of stainless steel has a concavity to hold the electrode plate 1, a projection 3' to mount a wafer 2 and a through hole 5 for rod feeder. According to this constitution, the electrode plate can be prevented from curving by reaction temperatures, and the wafer and the feeder can be detached easily. Yield and working efficiency are improved consequently.
JP3135179A 1979-03-16 1979-03-16 Plasma treating device Pending JPS55123130A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3135179A JPS55123130A (en) 1979-03-16 1979-03-16 Plasma treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3135179A JPS55123130A (en) 1979-03-16 1979-03-16 Plasma treating device

Publications (1)

Publication Number Publication Date
JPS55123130A true JPS55123130A (en) 1980-09-22

Family

ID=12328799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3135179A Pending JPS55123130A (en) 1979-03-16 1979-03-16 Plasma treating device

Country Status (1)

Country Link
JP (1) JPS55123130A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6192054U (en) * 1984-11-22 1986-06-14
JPS6337629A (en) * 1986-07-31 1988-02-18 Tokyo Electron Ltd Jig for holding wafer
JPS6358920A (en) * 1986-08-29 1988-03-14 Tokyo Electron Ltd Plasma electrode
JPS63207134A (en) * 1987-02-24 1988-08-26 Tokyo Electron Ltd Plasma processor
JPH01297140A (en) * 1988-05-25 1989-11-30 Kanebo Ltd Electrode for plasma processing

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6192054U (en) * 1984-11-22 1986-06-14
JPS6337629A (en) * 1986-07-31 1988-02-18 Tokyo Electron Ltd Jig for holding wafer
JPS6358920A (en) * 1986-08-29 1988-03-14 Tokyo Electron Ltd Plasma electrode
JPS63207134A (en) * 1987-02-24 1988-08-26 Tokyo Electron Ltd Plasma processor
JPH01297140A (en) * 1988-05-25 1989-11-30 Kanebo Ltd Electrode for plasma processing

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