JPS55118039A - Mask for x-ray exposure - Google Patents

Mask for x-ray exposure

Info

Publication number
JPS55118039A
JPS55118039A JP2649579A JP2649579A JPS55118039A JP S55118039 A JPS55118039 A JP S55118039A JP 2649579 A JP2649579 A JP 2649579A JP 2649579 A JP2649579 A JP 2649579A JP S55118039 A JPS55118039 A JP S55118039A
Authority
JP
Japan
Prior art keywords
layer
substrate
mask
diffused
boron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2649579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6161252B2 (cg-RX-API-DMAC7.html
Inventor
Fumio Yamagishi
Yuji Kimura
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2649579A priority Critical patent/JPS55118039A/ja
Publication of JPS55118039A publication Critical patent/JPS55118039A/ja
Publication of JPS6161252B2 publication Critical patent/JPS6161252B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2649579A 1979-03-07 1979-03-07 Mask for x-ray exposure Granted JPS55118039A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2649579A JPS55118039A (en) 1979-03-07 1979-03-07 Mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2649579A JPS55118039A (en) 1979-03-07 1979-03-07 Mask for x-ray exposure

Publications (2)

Publication Number Publication Date
JPS55118039A true JPS55118039A (en) 1980-09-10
JPS6161252B2 JPS6161252B2 (cg-RX-API-DMAC7.html) 1986-12-24

Family

ID=12195066

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2649579A Granted JPS55118039A (en) 1979-03-07 1979-03-07 Mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS55118039A (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62112933U (cg-RX-API-DMAC7.html) * 1986-01-10 1987-07-18

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337365A (en) * 1976-09-18 1978-04-06 Nippon Telegr & Teleph Corp <Ntt> Correcting method of d/a converting error for d/a converter
JPS53134367A (en) * 1977-04-28 1978-11-22 Toppan Printing Co Ltd Xxray mask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337365A (en) * 1976-09-18 1978-04-06 Nippon Telegr & Teleph Corp <Ntt> Correcting method of d/a converting error for d/a converter
JPS53134367A (en) * 1977-04-28 1978-11-22 Toppan Printing Co Ltd Xxray mask

Also Published As

Publication number Publication date
JPS6161252B2 (cg-RX-API-DMAC7.html) 1986-12-24

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